Inventor · disambiguated record
Edo Maria Hulsebos
Also filed as: HULSEBOS EDO MARIA
22 granted patents·39 citations·filing 2008–2024
93Inventor score
Top patents by PatentIndex Score
22 records- 0194US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0293US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 0391US11079684B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·3 cites·20 claims
- 0490US11994845B2Determining a correction to a processASML NETHERLANDS BV·Filed 2021·Granted May 28, 2024·2 cites·20 claims
- 0590US10331040B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jun 25, 2019·4 cites·20 claims
- 0689US10620549B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 14, 2020·3 cites·20 claims
- 0788US11966166B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2021·Granted Apr 23, 2024·1 cites·20 claims
- 0885US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 0983US8208140B2Alignment system and alignment marks for use therewithHULSEBOS EDO MARIA·Filed 2010·Granted Jun 26, 2012·4 cites·17 claims
- 1081US9665012B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted May 30, 2017·3 cites·22 claims
- 1180US12493285B2Determining a correction to a processASML NETHERLANDS BV·Filed 2024·Granted Dec 9, 2025·0 cites·20 claims
- 1280US10901326B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Jan 26, 2021·1 cites·22 claims
- 1379US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 1469US12287583B2Method for modeling measurement data over a substrate area and associated apparatusesASML NETHERLANDS BV·Filed 2021·Granted Apr 29, 2025·0 cites·14 claims
- 1569US11086305B2Determining a correction to a processASML NETHERLANDS BV·Filed 2021·Granted Aug 10, 2021·0 cites·28 claims
- 1669US8208139B2Alignment system and alignment marks for use therewithHULSEBOS EDO MARIA·Filed 2008·Granted Jun 26, 2012·2 cites·16 claims
- 1762US12032305B2Alignment method and associated alignment and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Jul 9, 2024·0 cites·20 claims
- 1859US11927892B2Alignment method and associated alignment and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Mar 12, 2024·0 cites·20 claims
- 1955US11181836B2Method for determining deformationASML NETHERLANDS BV·Filed 2018·Granted Nov 23, 2021·0 cites·20 claims
- 2047US10514620B2Alignment methodASML NETHERLANDS BV·Filed 2017·Granted Dec 24, 2019·0 cites·20 claims
- 2139US10139740B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 27, 2018·0 cites·20 claims
- 2236US10527957B2Method and apparatus for processing a substrate in a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jan 7, 2020·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →