Inventor · disambiguated record
Eiki Kamata
Also filed as: KAMATA EIKI
21 granted patents·21 pending applications·4 citations·filing 2018–2025
88Inventor score
Top patents by PatentIndex Score
42 records- 0188US12243718B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 4, 2025·2 cites·9 claims
- 0282US11410835B2Plasma density monitor, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·1 cites·20 claims
- 0377US11705310B2Plasma probe device, plasma processing apparatus, and control methodTOYO ELECTRON LTD·Filed 2020·Granted Jul 18, 2023·1 cites·13 claims
- 0473US2022277935A1Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0571US12412732B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Sep 9, 2025·0 cites·11 claims
- 0669US2019189398A1Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 0765US2025357095A1Method for controlling plasma measurement system and plasma measurement systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0864US2025104972A1Plasma Source and Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0964US2025104977A1Plasma Source and Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1063US2024412949A1Remote Plasma Device and Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1163US2025095973A1Plasma Processing Apparatus and Method for Measuring Resonance FrequencyTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1263US2024203692A1Plasma processing apparatus and plasma control methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1362US11476088B2Array antenna and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 18, 2022·0 cites·9 claims
- 1461US2024186114A1Plasma processing apparatus and assembly method of resonator array structureTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1561US2024312767A1Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1661US2024170259A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1761US2024186113A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1861US2025129474A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1960US12165846B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Dec 10, 2024·0 cites·12 claims
- 2060US11600475B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted Mar 7, 2023·0 cites·11 claims
- 2159US11355326B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted Jun 7, 2022·0 cites·15 claims
- 2259US2024030015A1Plasma processing apparatus and plasma state estimation methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2358US2025253138A1Plasma Processing Apparatus and Plasma Processing MethodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2458US2023238217A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2557US12444574B2Plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Oct 14, 2025·0 cites·18 claims
- 2657US11721528B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 8, 2023·0 cites·15 claims
- 2756US12338532B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jun 24, 2025·0 cites·8 claims
- 2856US2024030008A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2955US12407078B2Tuner, and impedance matching methodTOKYO ELECTRON LTD·Filed 2021·Granted Sep 2, 2025·0 cites·19 claims
- 3055US12237157B2Plasma measurement methodTOKYO ELECTRON LTD·Filed 2022·Granted Feb 25, 2025·0 cites·19 claims
- 3154US11967485B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Apr 23, 2024·0 cites·17 claims
- 3254US11842886B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 12, 2023·0 cites·5 claims
- 3354US2024404805A1Plasma processing apparatus, control method, and storing mediumTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3451US11784085B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 10, 2023·0 cites·16 claims
- 3550US12315700B2Plasma processing apparatus and ceiling wallTOKYO ELECTRON LTD·Filed 2020·Granted May 27, 2025·0 cites·15 claims
- 3650US12046453B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 23, 2024·0 cites·12 claims
- 3750US11887825B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jan 30, 2024·0 cites·11 claims
- 3850US2023326716A1Plasma processing apparatus, plasma processing method, and dielectric windowTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3948US12283465B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Apr 22, 2025·0 cites·8 claims
- 4046US2020388473A1Plasma electric field monitor, plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 4146US2020411340A1Heating apparatus, heating method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 4244US11164730B2Plasma probe device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 2, 2021·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →