Inventor · disambiguated record
Einosuke Tsuda
Also filed as: TSUDA EINOSUKE
9 granted patents·12 pending applications·513 citations·filing 2006–2024
83Inventor score
Top patents by PatentIndex Score
21 records- 0194US8945306B2Gas supply deviceTSUDA EINOSUKE·Filed 2010·Granted Feb 3, 2015·502 cites·9 claims
- 0290US8147786B2Gas exhaust system of film-forming apparatus, film-forming apparatus, and method for processing exhaust gasTSUDA EINOSUKE·Filed 2011·Granted Apr 3, 2012·8 cites·4 claims
- 0375US10950417B2Substrate processing apparatus and substrate loading mechanismTOKYO ELECTRON LTD·Filed 2018·Granted Mar 16, 2021·2 cites·9 claims
- 0471US12476091B2Electrostatic chuck and method of operation for plasma processingTOKYO ELECTRON LTD·Filed 2023·Granted Nov 18, 2025·0 cites·14 claims
- 0569US9984892B2Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming systemTOKYO ELECTRON LTD·Filed 2017·Granted May 29, 2018·1 cites·14 claims
- 0661US2025069912A1Heating device and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0758US2009191109A1Exhaust structure of film-forming apparatus, film-forming apparatus, and method for processing exhaust gasTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0857US2024145267A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0956US12094753B2Stage device and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Sep 17, 2024·0 cites·8 claims
- 1054US11281116B2Substrate stage and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Mar 22, 2022·0 cites·6 claims
- 1153US2023096191A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1252US2011098841A1Gas supply device, processing apparatus, processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1351US11393696B2Method of controlling substrate treatment apparatus, substrate treatment apparatus, and cluster systemTOKYO ELECTRON LTD·Filed 2020·Granted Jul 19, 2022·0 cites·20 claims
- 1450US2014209023A1Gas supply device, processing apparatus, processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1549US2022010428A1Substrate support, apparatus for processing substrate, and method of adjusting temperature of substrateTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1649US2020291514A1Film Forming Apparatus and Film Forming MethodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1745US2010272895A1Film deposition apparatus, film deposition method, storage medium, and gas supply apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1840US11193205B2Source material containerTOKYO ELECTRON LTD·Filed 2018·Granted Dec 7, 2021·0 cites·7 claims
- 1940US2009114296A1Valve element, valve, selector valve, and trap deviceTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2037US2018261464A1Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming systemTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2131US2015322571A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →