Inventor · disambiguated record
Eisaku Watanabe
Also filed as: WATANABE EISAKU
5 granted patents·1 pending application·12 citations·filing 2010–2014
69Inventor score
Top patents by PatentIndex Score
6 records- 0176US8778145B2Magnetic field control for uniform film thickness distribution in sputter apparatusWATANABE EISAKU·Filed 2011·Granted Jul 15, 2014·9 cites·8 claims
- 0263US8278211B2Thin film forming methodHIRAYAMA HANAKO·Filed 2011·Granted Oct 2, 2012·2 cites·9 claims
- 0344US8303785B2Plasma processing apparatus and electronic device manufacturing methodTANAKA YOH·Filed 2010·Granted Nov 6, 2012·1 cites·7 claims
- 0443US2014353149A1Tunnel magneto-resistance element manufacturing apparatusCANON ANELVA CORP·Filed 2014·Application pending·0 cites
- 0542US9885107B2Method for continuously forming noble metal film and method for continuously manufacturing electronic componentCANON ANELVA CORP·Filed 2012·Granted Feb 6, 2018·0 cites·7 claims
- 0640US8278212B2Method for manufacturing semiconductor memory element and sputtering apparatusWATANABE EISAKU·Filed 2011·Granted Oct 2, 2012·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →