Inventor · disambiguated record
Ellie Yieh
Also filed as: YIEH ELLIE · YIEH ELLIE Y
178 granted patents·69 pending applications·12,319 citations·filing 1992–2025
99Inventor score
Files withAPPLIED MATERIALS INC229MICROMATERIALS LLC4NEMANI SRINIVAS D4LUBOMIRSKY DMITRY2MALLICK ABHIJIT BASU1
Top patents by PatentIndex Score
247 records- 0199US7326657B2Post-deposition treatment to enhance properties of Si-O-C low k filmsAPPLIED MATERIALS INC·Filed 2004·Granted Feb 5, 2008·524 cites·9 claims
- 0299US6632478B2Process for forming a low dielectric constant carbon-containing filmAPPLIED MATERIALS INC·Filed 2001·Granted Oct 14, 2003·658 cites·46 claims
- 0399US6413583B1Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compoundAPPLIED MATERIALS INC·Filed 1999·Granted Jul 2, 2002·725 cites·6 claims
- 0499US6347636B1Methods and apparatus for gettering fluorine from chamber material surfacesAPPLIED MATERIALS INC·Filed 1999·Granted Feb 19, 2002·579 cites·12 claims
- 0598US10923367B2Process chamber for etching low K and other dielectric filmsAPPLIED MATERIALS INC·Filed 2018·Granted Feb 16, 2021·41 cites·34 claims
- 0698US8242031B2High quality silicon oxide films by remote plasma CVD from disilane precursorsMALLICK ABHIJIT BASU·Filed 2010·Granted Aug 14, 2012·570 cites·8 claims
- 0798US7967913B2Remote plasma clean process with cycled high and low pressure clean stepsAPPLIED MATERIALS INC·Filed 2009·Granted Jun 28, 2011·477 cites·19 claims
- 0898US7867923B2High quality silicon oxide films by remote plasma CVD from disilane precursorsAPPLIED MATERIALS INC·Filed 2007·Granted Jan 11, 2011·106 cites·16 claims
- 0998US7541297B2Method and system for improving dielectric film quality for void free gap fillAPPLIED MATERIALS INC·Filed 2007·Granted Jun 2, 2009·664 cites·7 claims
- 1098US6627532B1Method of decreasing the K value in SiOC layer deposited by chemical vapor depositionAPPLIED MATERIALS INC·Filed 2000·Granted Sep 30, 2003·358 cites·27 claims
- 1198US6602806B1Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide filmAPPLIED MATERIALS INC·Filed 2000·Granted Aug 5, 2003·549 cites·11 claims
- 1298US6465366B1Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layersAPPLIED MATERIALS INC·Filed 2000·Granted Oct 15, 2002·315 cites·44 claims
- 1398US5812403AMethods and apparatus for cleaning surfaces in a substrate processing systemAPPLIED MATERIALS INC·Filed 1996·Granted Sep 22, 1998·459 cites·20 claims
- 1497US10720341B2Gas delivery system for high pressure processing chamberMICROMATERIALS LLC·Filed 2018·Granted Jul 21, 2020·20 cites·9 claims
- 1597US10622214B2Tungsten defluorination by high pressure treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Apr 14, 2020·15 cites·20 claims
- 1697US10269571B2Methods for fabricating nanowire for semiconductor applicationsAPPLIED MATERIALS INC·Filed 2017·Granted Apr 23, 2019·19 cites·20 claims
- 1797US9777378B2Advanced process flow for high quality FCVD filmsAPPLIED MATERIALS INC·Filed 2015·Granted Oct 3, 2017·18 cites·19 claims
- 1897US9484202B1Apparatus and methods for spacer deposition and selective removal in an advanced patterning processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 1, 2016·22 cites·18 claims
- 1997US9412613B2Development of high etch selective hardmask material by ion implantation into amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2014·Granted Aug 9, 2016·54 cites·10 claims
- 2097US8143174B2Post-deposition treatment to enhance properties of Si-O-C low K filmsXIA LI-QUN·Filed 2008·Granted Mar 27, 2012·521 cites·17 claims
- 2197US7943531B2Methods for forming a silicon oxide layer over a substrateAPPLIED MATERIALS INC·Filed 2007·Granted May 17, 2011·67 cites·26 claims
- 2297US6764958B1Method of depositing dielectric filmsAPPLIED MATERIALS INC·Filed 2000·Granted Jul 20, 2004·314 cites·45 claims
- 2397US6635575B1Methods and apparatus to enhance properties of Si-O-C low K filmsAPPLIED MATERIALS INC·Filed 2000·Granted Oct 21, 2003·150 cites·10 claims
- 2497US6593247B1Method of depositing low k films using an oxidizing plasmaAPPLIED MATERIALS INC·Filed 2000·Granted Jul 15, 2003·129 cites·63 claims
- 2597US6503843B1Multistep chamber cleaning and film deposition process using a remote plasma that also enhances film gap fillAPPLIED MATERIALS INC·Filed 1999·Granted Jan 7, 2003·322 cites·19 claims
- 2697US6374831B1Accelerated plasma cleanAPPLIED MATERIALS INC·Filed 1999·Granted Apr 23, 2002·642 cites·15 claims
- 2797US6352591B1Methods and apparatus for shallow trench isolationAPPLIED MATERIALS INC·Filed 2000·Granted Mar 5, 2002·112 cites·18 claims
- 2897US6114216AMethods for shallow trench isolationAPPLIED MATERIALS INC·Filed 1996·Granted Sep 5, 2000·230 cites·16 claims
- 2996US10714331B2Method to fabricate thermally stable low K-FinFET spacerAPPLIED MATERIALS INC·Filed 2019·Granted Jul 14, 2020·15 cites·20 claims
- 3096US10636704B2Seam-healing method upon supra-atmospheric process in diffusion promoting ambientAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·14 cites·20 claims
- 3196US8232176B2Dielectric deposition and etch back processes for bottom up gapfillLUBOMIRSKY DMITRY·Filed 2007·Granted Jul 31, 2012·48 cites·6 claims
- 3296US7758698B2Dual top gas feed through distributor for high density plasma chamberAPPLIED MATERIALS INC·Filed 2006·Granted Jul 20, 2010·450 cites·8 claims
- 3396US6890850B2Method of depositing dielectric materials in damascene applicationsAPPLIED MATERIALS INC·Filed 2002·Granted May 10, 2005·92 cites·27 claims
- 3496US6569257B1Method for cleaning a process chamberAPPLIED MATERIALS INC·Filed 2000·Granted May 27, 2003·86 cites·67 claims
- 3596US6486082B1CVD plasma assisted lower dielectric constant sicoh filmAPPLIED MATERIALS INC·Filed 2001·Granted Nov 26, 2002·80 cites·30 claims
- 3696US6465372B1Surface treatment of C-doped SiO2 film to enhance film stability during O2 ashingAPPLIED MATERIALS INC·Filed 2000·Granted Oct 15, 2002·101 cites·15 claims
- 3796US5994209AMethods and apparatus for forming ultra-shallow doped regions using doped silicon oxide filmsAPPLIED MATERIALS INC·Filed 1996·Granted Nov 30, 1999·161 cites·18 claims
- 3896US5963840AMethods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditionsAPPLIED MATERIALS INC·Filed 1996·Granted Oct 5, 1999·200 cites·20 claims
- 3996US5935340AMethod and apparatus for gettering fluorine from chamber material surfacesAPPLIED MATERIALS INC·Filed 1996·Granted Aug 10, 1999·206 cites·12 claims
- 4095US10847360B2High pressure treatment of silicon nitride filmAPPLIED MATERIALS INC·Filed 2017·Granted Nov 24, 2020·15 cites·17 claims
- 4195US10566188B2Method to improve film stabilityAPPLIED MATERIALS INC·Filed 2018·Granted Feb 18, 2020·16 cites·20 claims
- 4295US10240232B2Gas control in process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 26, 2019·5 cites·17 claims
- 4395US10049927B2Seam-healing method upon supra-atmospheric process in diffusion promoting ambientAPPLIED MATERIALS INC·Filed 2016·Granted Aug 14, 2018·14 cites·20 claims
- 4495US7524750B2Integrated process modulation (IPM) a novel solution for gapfill with HDP-CVDAPPLIED MATERIALS INC·Filed 2006·Granted Apr 28, 2009·55 cites·21 claims
- 4594US6500773B1Method of depositing organosilicate layersAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·63 cites·39 claims
- 4693US9515166B2Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applicationsAPPLIED MATERIALS INC·Filed 2014·Granted Dec 6, 2016·14 cites·19 claims
- 4793US9385219B2Method and apparatus for selective depositionAPPLIED MATERIALS INC·Filed 2015·Granted Jul 5, 2016·11 cites·20 claims
- 4893US6486061B1Post-deposition treatment to enhance properties of Si-O-C low K filmsAPPLIED MATERIALS INC·Filed 2000·Granted Nov 26, 2002·83 cites·13 claims
- 4993US6110556ALid assembly for a process chamber employing asymmetric flow geometriesAPPLIED MATERIALS INC·Filed 1997·Granted Aug 29, 2000·218 cites·20 claims
- 5092US9852916B2Single platform, multiple cycle spacer deposition and etchAPPLIED MATERIALS INC·Filed 2016·Granted Dec 26, 2017·7 cites·12 claims
Showing the top 50 of 247 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →