Inventor · disambiguated record
Emilia Hirsch
Also filed as: HIRSCH EMILIA
1 granted patent·4 pending applications·0 citations·filing 2022–2024
11Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD5
Top patents by PatentIndex Score
5 records- 0160US12424442B2Methods for forming semiconductor devices using modified photomask layerTOKYO ELECTRON LTD·Filed 2022·Granted Sep 23, 2025·0 cites·20 claims
- 0252US2025308986A1Back end of line (beol) interconnection approachTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0352US2025299927A1Plasma etch-deposition processes and systemsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0452US2025309001A1Metallization and planarizationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0545US2023343554A1Methods To Provide Anisotropic Etching Of Metal Hard Masks Using A Radio Frequency Modulated Pulsed Plasma SchemeTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →