Inventor · disambiguated record
Enle Choo
Also filed as: CHOO ENLE
8 granted patents·8 pending applications·5 citations·filing 2020–2025
76Inventor score
Files withAPPLIED MATERIALS INC16
Top patents by PatentIndex Score
16 records- 0193US11261538B1In-situ temperature mapping for epi chamberAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·3 cites·19 claims
- 0291US12385159B2In-situ epi growth rate control of crystal thickness micro-balancing sensorAPPLIED MATERIALS INC·Filed 2022·Granted Aug 12, 2025·2 cites·20 claims
- 0373US2025096045A1Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0473US2025275015A1Epitaxial deposition chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0570US12324061B2Epitaxial deposition chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jun 3, 2025·0 cites·20 claims
- 0667US12493307B2Fast switching gas circuits and processing chambers, and related methods and apparatus, for gas stabilizationAPPLIED MATERIALS INC·Filed 2023·Granted Dec 9, 2025·0 cites·14 claims
- 0766US2024120197A1Growth monitor system and methods for film depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0863US2025231066A1Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0962US11848202B2Growth monitor system and methods for film depositionAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·0 cites·20 claims
- 1061US12449309B2Methods for detection using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 21, 2025·0 cites·20 claims
- 1161US12165934B2Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Dec 10, 2024·0 cites·18 claims
- 1258US12196617B2Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 14, 2025·0 cites·20 claims
- 1355US2025132176A1Heaters, and related chamber kits and processing chambers, for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1451US2022397706A1Axisymmetric heating assembly layout with double ended lampAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1550US2022375800A1In situ film growth sensor assembly, apparatus, and methodsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1648US2025027716A1Improved reflector for process chamberAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →