Inventor · disambiguated record
Erik Petrus Buurman
Also filed as: BUURMAN ERIK PETRUS
15 granted patents·3 pending applications·57 citations·filing 2004–2016
91Inventor score
Files withASML NETHERLANDS BV10LOOPSTRA ERIK ROELOF4DE KRUIF ROBERTUS CORNELIS MARTINUS2BUURMAN ERIK PETRUS1MESTROM WILBERT JAN1
Top patents by PatentIndex Score
18 records- 0191US8598551B2EUV radiation source comprising a droplet accelerator and lithographic apparatusMESTROM WILBERT JAN·Filed 2010·Granted Dec 3, 2013·11 cites·15 claims
- 0287US7525638B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Apr 28, 2009·9 cites·11 claims
- 0381US7817247B2Lithographic apparatus, excimer laser and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 19, 2010·5 cites·22 claims
- 0481US7655367B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Feb 2, 2010·5 cites·14 claims
- 0579US9110377B2Lithographic apparatus, EUV radiation generation apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2011·Granted Aug 18, 2015·5 cites·15 claims
- 0678US7595863B2Lithographic apparatus, excimer laser and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 29, 2009·5 cites·21 claims
- 0776US8663881B2Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a deviceBUURMAN ERIK PETRUS·Filed 2012·Granted Mar 4, 2014·7 cites·12 claims
- 0868US7868999B2Lithographic apparatus, source, source controller and control methodASML NETHERLANDS BV·Filed 2006·Granted Jan 11, 2011·3 cites·23 claims
- 0967US7453551B2Increasing pulse-to-pulse radiation beam uniformityASML NETHERLANDS BV·Filed 2006·Granted Nov 18, 2008·2 cites·33 claims
- 1065US8089613B2Lithographic apparatus, excimer laser and device manufacturing methodDE KRUIF ROBERTUS CORNELIS MARTINUS·Filed 2010·Granted Jan 3, 2012·1 cites·19 claims
- 1164US10222702B2Radiation sourceASML NETHERLANDS BV·Filed 2016·Granted Mar 5, 2019·1 cites·15 claims
- 1258US2010091260A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 1356US8431916B2Radiation source and lithographic apparatusLOOPSTRA ERIK ROELOF·Filed 2009·Granted Apr 30, 2013·3 cites·19 claims
- 1450US9316924B2Lithographic apparatus, excimer laser and device manufacturing methodDE KRUIF ROBERTUS CORNELIS MARTINUS·Filed 2011·Granted Apr 19, 2016·0 cites·20 claims
- 1544US8462826B2Laser deviceLOOPSTRA ERIK ROELOF·Filed 2010·Granted Jun 11, 2013·0 cites·11 claims
- 1636US2011273691A1Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a deviceASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 1735US2012280148A1Euv radiation source and lithographic apparatusLOOPSTRA ERIK ROELOF·Filed 2010·Application pending·0 cites
- 1834US7491478B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 17, 2009·0 cites·21 claims
Join the waitlist — get patent alerts
Get an alert when Erik Petrus Buurman files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →