Inventor · disambiguated record
Eric Eva
Also filed as: EVA ERIC
20 granted patents·12 pending applications·91 citations·filing 2002–2025
92Inventor score
Top patents by PatentIndex Score
32 records- 0192US8508854B2Optical element and methodEVA ERIC·Filed 2010·Granted Aug 13, 2013·12 cites·59 claims
- 0288US7196842B2Attenuating filter for ultraviolet lightZEISS CARL SMT AG·Filed 2004·Granted Mar 27, 2007·34 cites·33 claims
- 0387US7352452B2Method and apparatus for setting optical imaging properties by means of radiation treatmentZEISS CARL SMT AG·Filed 2005·Granted Apr 1, 2008·18 cites·21 claims
- 0483US8891172B2Optical element and methodEVA ERIC·Filed 2009·Granted Nov 18, 2014·7 cites·7 claims
- 0582US2025362582A1Optical element having a polishing layer, lithography apparatus comprising the optical element, and method for producing the optical elementZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0678US10427965B2Method for loading a blank composed of fused silica with hydrogen, lens element and projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Oct 1, 2019·1 cites·21 claims
- 0771US10976667B2Optical manipulator, projection lens and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Apr 13, 2021·1 cites·30 claims
- 0871US7791811B2Lens blank and lens elements as well as method for their productionZEISS CARL SMT AG·Filed 2007·Granted Sep 7, 2010·4 cites·4 claims
- 0969US10649340B2Reflective optical element for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted May 12, 2020·1 cites·18 claims
- 1067US7907347B2Optical composite material and method for its productionZEISS CARL SMT AG·Filed 2006·Granted Mar 15, 2011·2 cites·24 claims
- 1166US2024219849A1Optical element with cooling channels, and optical arrangementZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1265US12117731B2Method for producing a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Oct 15, 2024·0 cites·17 claims
- 1365US11987521B2Substrate for a reflective optical elementZEISS CARL SMT GMBH·Filed 2020·Granted May 21, 2024·0 cites·19 claims
- 1465US11874525B2Optical element and lithography systemZEISS CARL SMT GMBH·Filed 2022·Granted Jan 16, 2024·0 cites·21 claims
- 1565US2025231399A1Mirror, in particular for a microlithographic projection exposure apparatus, and method of processing a mirrorZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1664US2023375939A1Method for producing a multi-part mirror of a projection illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1760US11126087B2Component for a mirror array for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted Sep 21, 2021·0 cites·19 claims
- 1860US6740159B2Method of making a fracture-resistant calcium fluoride single crystal and its useSCHOTT GLAS·Filed 2002·Granted May 25, 2004·8 cites·14 claims
- 1958US2024019613A1Method for producing a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2058US2024027730A1Method for producing a mirror of a lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2158US2025135716A1Method for producing a main body of an optical element for semiconductor lithography, main body, optical element and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 2256US7934390B2Method for manufacturing a lens of synthetic quartz glass with increased H2 contentZEISS CARL SMT GMBH·Filed 2007·Granted May 3, 2011·0 cites·7 claims
- 2353US11099484B2Method for repairing reflective optical elements for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 2453US8780448B2Lens blank and lens elements as well as method for their productionEVA ERIC·Filed 2012·Granted Jul 15, 2014·0 cites·16 claims
- 2552US6992753B2Projection optical systemZEISS CARL SMT AG·Filed 2003·Granted Jan 31, 2006·3 cites·38 claims
- 2650US9036152B2Method and apparatus for determining the absorption in a blankZEISS CARL SMT GMBH·Filed 2014·Granted May 19, 2015·0 cites·29 claims
- 2750US8174771B2Lens blank and lens elements as well as method for their productionEVA ERIC·Filed 2010·Granted May 8, 2012·0 cites·18 claims
- 2849US2011203320A1Method for manufacturing a lens of synthetic quartz glass with increased h2 contentZEISS CARL SMT GMBH·Filed 2011·Application pending·0 cites
- 2942US2007195307A1Projection lens and method for performing microlithographyZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3040US2002191310A1Attenuating filter for ultraviolet lightZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
- 3140US2004250572A1Method for producing radiation-resistant quartz glass material, and quartz glass materialZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 3240US2010149500A1Projection lens for microlithography and corresponding terminal elementZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →