Inventor · disambiguated record
Erik Johannes Maria Wallerbos
Also filed as: WALLERBOS ERIK JOHANNES MARIA
13 granted patents·2 pending applications·10 citations·filing 2016–2023
86Inventor score
Files withASML NETHERLANDS BV15
Top patents by PatentIndex Score
15 records- 0188US10802408B2Method for optimization of a lithographic processASML NETHERLANDS BV·Filed 2017·Granted Oct 13, 2020·3 cites·23 claims
- 0282US11378891B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·1 cites·20 claims
- 0381US11782349B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2023·Granted Oct 10, 2023·0 cites·20 claims
- 0479US10816904B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·2 cites·26 claims
- 0577US11592753B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2022·Granted Feb 28, 2023·0 cites·20 claims
- 0677US10877381B2Methods of determining corrections for a patterning processASML NETHERLANDS BV·Filed 2017·Granted Dec 29, 2020·1 cites·20 claims
- 0776US11170072B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Nov 9, 2021·2 cites·21 claims
- 0875US11106141B2Optimizing a sequence of processes for manufacturing of product unitsASML NETHERLANDS BV·Filed 2018·Granted Aug 31, 2021·1 cites·21 claims
- 0972US11327407B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted May 10, 2022·0 cites·20 claims
- 1071US11442367B2Optimizing a sequence of processes for manufacturing of product unitsASML NETHERLANDS BV·Filed 2021·Granted Sep 13, 2022·0 cites·20 claims
- 1167US2022342319A1Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1266US11480884B2Method for optimization of a lithographic processASML NETHERLANDS BV·Filed 2020·Granted Oct 25, 2022·0 cites·20 claims
- 1361US2022027437A1Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1455US10809631B2Method of monitoring and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Oct 20, 2020·0 cites·21 claims
- 1546US10928737B2Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer programASML NETHERLANDS BV·Filed 2017·Granted Feb 23, 2021·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Erik Johannes Maria Wallerbos files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →