Inventor · disambiguated record
Etsuko Iguchi
Also filed as: IGUCHI ETSUKO
23 granted patents·1 pending application·447 citations·filing 1996–2002
97Inventor score
Top patents by PatentIndex Score
24 records- 0188US6284428B1Undercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 4, 2001·29 cites·13 claims
- 0285US5736296APositive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 7, 1998·46 cites·24 claims
- 0379US6268108B1Composition for forming antireflective coating film and method for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 31, 2001·40 cites·7 claims
- 0479US5939510AUndercoating composition for photolithographic resistTOKYO OHKA KOGYA CO LTD·Filed 1997·Granted Aug 17, 1999·38 cites·6 claims
- 0577US6689535B2Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming patternTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Feb 10, 2004·14 cites·8 claims
- 0675US6544717B2Undercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 8, 2003·14 cites·9 claims
- 0773US5756255AUndercoating composition for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted May 26, 1998·38 cites·8 claims
- 0871US6693049B2Method for filling fine holeTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Feb 17, 2004·17 cites·3 claims
- 0963US6734258B2Protective coating composition for dual damascene processTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted May 11, 2004·5 cites·4 claims
- 1063US5700625ANegative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Dec 23, 1997·22 cites·4 claims
- 1162US6319815B1Electric wiring forming method with use of embedding materialTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Nov 20, 2001·32 cites·5 claims
- 1261US6042988AChemical-amplification-type negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Mar 28, 2000·20 cites·15 claims
- 1360US6297174B2Method for the formation of a planarizing coating film on substrate surfaceTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Oct 2, 2001·7 cites·6 claims
- 1460US6071673AMethod for the formation of resist patternTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jun 6, 2000·26 cites·9 claims
- 1560US5948847AUndercoating composition for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Sep 7, 1999·19 cites·10 claims
- 1658US5925495APhotoresist laminate and method for patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 20, 1999·15 cites·5 claims
- 1757US6159652APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 12, 2000·12 cites·4 claims
- 1855US6087068AUndercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 11, 2000·13 cites·13 claims
- 1953US5908738AUndercoating composition for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jun 1, 1999·15 cites·9 claims
- 2052US6083665APhotoresist laminate and method for patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 4, 2000·11 cites·1 claims
- 2149US6599682B2Method for forming a finely patterned photoresist layerTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jul 29, 2003·2 cites·5 claims
- 2242US5789136ANegative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 4, 1998·9 cites·9 claims
- 2339US2001049072A1Undercoating composition for photolithographic resistFiled 2000·Application pending·0 cites
- 2437US5854357AProcess for the production of polyhydroxstyreneTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 29, 1998·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →