Inventor · disambiguated record
Euclid E. Moon
Also filed as: MOON EUCLID E · MOON EUCLID EBERLE
9 granted patents·762 citations·filing 1993–2017
91Inventor score
Top patents by PatentIndex Score
9 records- 0196US6522411B1Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one directionMASSACHUSETTS INST TECHNOLOGY·Filed 2000·Granted Feb 18, 2003·108 cites·17 claims
- 0296US5808742AOptical alignment apparatus having multiple parallel alignment marksMASSACHUSETTS INST TECHNOLOGY·Filed 1996·Granted Sep 15, 1998·197 cites·15 claims
- 0395US7474410B2Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithographyMASSACHUSETTS INST TECHNOLOGY·Filed 2007·Granted Jan 6, 2009·34 cites·33 claims
- 0495US5414514AOn-axis interferometric alignment of plates using the spatial phase of interference patternsMASSACHUSETTS INST TECHNOLOGY·Filed 1993·Granted May 9, 1995·273 cites·18 claims
- 0594US7247843B1Long-range gap detection with interferometric sensitivity using spatial phase of interference patternsMASSACHUSETTS INST TECHNOLOGY·Filed 2006·Granted Jul 24, 2007·29 cites·7 claims
- 0694US6088103AOptical interference alignment and gapping apparatusMASSACHUSETTS INST TECHNOLOGY·Filed 1998·Granted Jul 11, 2000·118 cites·62 claims
- 0770US7535581B2Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marksMASSACHUSETTS INST TECHNOLOGY·Filed 2007·Granted May 19, 2009·2 cites·20 claims
- 0861US7800761B2Infrared interferometric-spatial-phase imaging using backside wafer marksMASSACHUSETTS INST TECHNOLOGY·Filed 2007·Granted Sep 21, 2010·1 cites·30 claims
- 0951US10408754B2Method of measuring a target, substrate, metrology apparatus, and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Sep 10, 2019·0 cites·21 claims
Join the waitlist — get patent alerts
Get an alert when Euclid E. Moon files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →