Inventor · disambiguated record
Eva Mondt
Also filed as: MONDT EVA
11 granted patents·1 pending application·25 citations·filing 2007–2017
85Inventor score
Files withASML NETHERLANDS BV3MONDT EVA3JACOBS HERNES2AUER-JONGEPIER SUZAN LEONIE1DUINEVELD PAULUS CORNELIS1
Top patents by PatentIndex Score
12 records- 0190US8634053B2Lithographic apparatus and device manufacturing methodRIEPEN MICHEL·Filed 2007·Granted Jan 21, 2014·12 cites·27 claims
- 0271US9040938B2Device comprising a source for emitting ultraviolet lightDUINEVELD PAULUS CORNELIS·Filed 2010·Granted May 26, 2015·2 cites·14 claims
- 0371US8274641B2Substrate table, lithographic apparatus and device manufacturing methodMONDT EVA·Filed 2009·Granted Sep 25, 2012·3 cites·20 claims
- 0467US8614424B2Device comprising means for guiding fluid from an inlet to an outletMONDT EVA·Filed 2010·Granted Dec 24, 2013·1 cites·16 claims
- 0565US9242194B2Device for purifying a fluidVAN DER KOOL JOHANNES TSEARD·Filed 2011·Granted Jan 26, 2016·4 cites·12 claims
- 0663US8634052B2Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate tableAUER-JONGEPIER SUZAN LEONIE·Filed 2007·Granted Jan 21, 2014·3 cites·34 claims
- 0760US10268127B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Apr 23, 2019·0 cites·20 claims
- 0859US9645506B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted May 9, 2017·0 cites·20 claims
- 0954US7692765B2Lithographic apparatus and method of removing liquidASML NETHERLANDS BV·Filed 2007·Granted Apr 6, 2010·0 cites·23 claims
- 1047US8675172B2Lithographic apparatus and method of removing liquidJACOBS HERNES·Filed 2010·Granted Mar 18, 2014·0 cites·20 claims
- 1143US8416383B2Lithographic apparatus and methodJACOBS HERNES·Filed 2007·Granted Apr 9, 2013·0 cites·22 claims
- 1240US2013119266A1Device for subjecting a fluid to a disinfecting treatment by exposing the fluid to ultraviolet lightMONDT EVA·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →