Inventor · disambiguated record
Ewald Losert
Also filed as: LOSERT EWALD
12 granted patents·377 citations·filing 1973–1996
93Inventor score
Top patents by PatentIndex Score
12 records- 0191US4413052APhotopolymerization process employing compounds containing acryloyl group and anthryl groupCIBA GEIGY CORP·Filed 1982·Granted Nov 1, 1983·66 cites·16 claims
- 0289US4440850APhotopolymerisation process with two exposures of a single layerCIBA GEIGY CORP·Filed 1982·Granted Apr 3, 1984·29 cites·13 claims
- 0385US4632900AProcess for the production of images after electrodeposition of positive photoresist on electrically conductive surfaceCIBA GEIGY CORP·Filed 1985·Granted Dec 30, 1986·56 cites·19 claims
- 0485US4544623APhotosensitive coating composition and the use thereof for protective purposesCIBA GEIGY CORP·Filed 1984·Granted Oct 1, 1985·51 cites·16 claims
- 0585US4416975APhotopolymerization process employing compounds containing acryloyl groups and maleimide groupsCIBA GEIGY CORP·Filed 1982·Granted Nov 22, 1983·42 cites·20 claims
- 0684US4230793AProcess for the production of solder masks for printed circuitsCIBA GEIGY CORP·Filed 1978·Granted Oct 28, 1980·43 cites·3 claims
- 0776US3956043AProcess for the manufacture of printed multi-layer circuitsCIBA GEIGY CORP·Filed 1973·Granted May 11, 1976·24 cites·11 claims
- 0870US4161588APolymerizable estersCIBA GEIGY CORP·Filed 1978·Granted Jul 17, 1979·6 cites·7 claims
- 0963US5124233APhotoresist compositionsCIBA GEIGY CORP·Filed 1988·Granted Jun 23, 1992·15 cites·11 claims
- 1061US4502957AProcess for purifying organic solutionsCIBA GEIGY CORP·Filed 1982·Granted Mar 5, 1985·17 cites·13 claims
- 1149US3996121ARadiation polymerizable estersCIBA GEIGY CORP·Filed 1975·Granted Dec 7, 1976·9 cites·11 claims
- 1247US6321443B1Connection substrateHEINZE DYCONEX PATENTE·Filed 1996·Granted Nov 27, 2001·19 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →