Inventor · disambiguated record
Fang Mei
Also filed as: MEI FANG
6 granted patents·5 pending applications·73 citations·filing 2004–2025
80Inventor score
Top patents by PatentIndex Score
11 records- 0195US7514353B2Contact metallization scheme using a barrier layer over a silicide layerAPPLIED MATERIALS INC·Filed 2006·Granted Apr 7, 2009·37 cites·33 claims
- 0287US8225496B2Automated integrated solar cell production line composed of a plurality of automated modules and tools including an autoclave for curing solar devices that have been laminatedBACHRACH ROBERT Z·Filed 2008·Granted Jul 24, 2012·29 cites·4 claims
- 0372US7829356B2Thin film scribe processAPPLIED MATERIALS INC·Filed 2008·Granted Nov 9, 2010·3 cites·20 claims
- 0469US2025169199A1Photovoltaic device with transparent tunnel junctionFIRST SOLAR INC·Filed 2025·Application pending·0 cites
- 0567US7910476B2Adhesion and minimizing oxidation on electroless CO alloy films for integration with low K inter-metal dielectric and etch stopAPPLIED MATERIALS INC·Filed 2008·Granted Mar 22, 2011·3 cites·23 claims
- 0659US12206037B2Photovoltaic device with transparent tunnel junctionFIRST SOLAR INC·Filed 2017·Granted Jan 21, 2025·0 cites·21 claims
- 0759US8333843B2Process to remove metal contamination on a glass substrateMEI FANG·Filed 2009·Granted Dec 18, 2012·1 cites·22 claims
- 0847US2010047954A1Photovoltaic production lineSU TZAY-FA JEFF·Filed 2009·Application pending·0 cites
- 0946US2007099417A1Adhesion and minimizing oxidation on electroless CO alloy films for integration with low K inter-metal dielectric and etch stopAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1039US2005170650A1Electroless palladium nitrate activation prior to cobalt-alloy depositionFiled 2004·Application pending·0 cites
- 1135US2007095367A1Apparatus and method for atomic layer cleaning and polishingWANG YAXIN·Filed 2005·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Fang Mei files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →