Inventor · disambiguated record
Felix Kozakevich
Also filed as: KOZAKEVICH FELIX · KOZAKEVICH FELIX LEIB
58 granted patents·16 pending applications·1,353 citations·filing 1996–2025
99Inventor score
Top patents by PatentIndex Score
74 records- 0198US10115568B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2017·Granted Oct 30, 2018·57 cites·26 claims
- 0298US9852889B1Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2016·Granted Dec 26, 2017·135 cites·21 claims
- 0397US11935726B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2021·Granted Mar 19, 2024·6 cites·31 claims
- 0497US10504744B1Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 10, 2019·25 cites·12 claims
- 0597US9761414B2Uniformity control circuit for use within an impedance matching circuitLAM RES CORP·Filed 2015·Granted Sep 12, 2017·38 cites·23 claims
- 0697US9595424B2Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processesLAM RES CORP·Filed 2015·Granted Mar 14, 2017·50 cites·21 claims
- 0797US6017414AMethod of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambersLAM RES CORP·Filed 1997·Granted Jan 25, 2000·186 cites·39 claims
- 0896US12387909B2Low frequency RF generator and associated electrostatic chuckLAM RES CORP·Filed 2021·Granted Aug 12, 2025·3 cites·20 claims
- 0996US11908660B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2022·Granted Feb 20, 2024·2 cites·20 claims
- 1096US10283330B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2017·Granted May 7, 2019·14 cites·19 claims
- 1196US7430986B2Plasma confinement ring assemblies having reduced polymer deposition characteristicsLAM RES CORP·Filed 2005·Granted Oct 7, 2008·28 cites·20 claims
- 1295US12165844B2Uniformity control circuit for impedance matchLAM RES CORP·Filed 2021·Granted Dec 10, 2024·3 cites·20 claims
- 1395US11651991B2Electrostatic Chuck design for cooling-gas light-up preventionLAM RES CORP·Filed 2021·Granted May 16, 2023·2 cites·15 claims
- 1495US10615003B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2018·Granted Apr 7, 2020·9 cites·20 claims
- 1595US9984859B2Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processesLAM RES CORP·Filed 2017·Granted May 29, 2018·15 cites·18 claims
- 1695US7749353B2High aspect ratio etch using modulation of RF powers of various frequenciesLAM RES CORP·Filed 2006·Granted Jul 6, 2010·30 cites·16 claims
- 1795US7525787B2Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating sameLAM RES CORP·Filed 2005·Granted Apr 28, 2009·29 cites·32 claims
- 1894US11158488B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2019·Granted Oct 26, 2021·13 cites·36 claims
- 1994US7169256B2Plasma processor with electrode responsive to multiple RF frequenciesLAM RES CORP·Filed 2004·Granted Jan 30, 2007·60 cites·63 claims
- 2094US6303044B1Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambersLAM RES CORP·Filed 1999·Granted Oct 16, 2001·186 cites·21 claims
- 2193US11195706B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2019·Granted Dec 7, 2021·7 cites·21 claims
- 2293US6071573AProcess for precoating plasma CVD reactorsLAM RES CORP·Filed 1997·Granted Jun 6, 2000·132 cites·17 claims
- 2392US11335539B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2018·Granted May 17, 2022·6 cites·29 claims
- 2492US10002746B1Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2017·Granted Jun 19, 2018·8 cites·26 claims
- 2591US10825656B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2020·Granted Nov 3, 2020·2 cites·20 claims
- 2690US10304662B2Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2018·Granted May 28, 2019·5 cites·26 claims
- 2789US10861708B2Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2019·Granted Dec 8, 2020·4 cites·20 claims
- 2889US7683289B2Apparatus and method for controlling plasma density profileLAM RES CORP·Filed 2005·Granted Mar 23, 2010·31 cites·12 claims
- 2988US8262922B2Plasma confinement rings having reduced polymer deposition characteristicsDHINDSA RAJINDER·Filed 2008·Granted Sep 11, 2012·8 cites·12 claims
- 3087US12308211B2Systems and methods for use of low frequency harmonics in bias radiofrequency supply to control uniformity of plasma process results across substrateLAM RES CORP·Filed 2021·Granted May 20, 2025·1 cites·28 claims
- 3187US12131886B2Systems and methods for extracting process control information from radiofrequency supply system of plasma processing systemLAM RES CORP·Filed 2021·Granted Oct 29, 2024·1 cites·17 claims
- 3287US8299390B2Apparatus and method for controlling plasma density profileDHINDSA RAJINDER·Filed 2010·Granted Oct 30, 2012·13 cites·13 claims
- 3386US12354840B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2024·Granted Jul 8, 2025·0 cites·20 claims
- 3486US6016766AMicrowave plasma processorLAM RES CORP·Filed 1997·Granted Jan 25, 2000·54 cites·16 claims
- 3584US10115564B2Uniformity control circuit for use within an impedance matching circuitLAM RES CORP·Filed 2017·Granted Oct 30, 2018·3 cites·18 claims
- 3684US7405521B2Multiple frequency plasma processor method and apparatusLAM RES CORP·Filed 2003·Granted Jul 29, 2008·35 cites·45 claims
- 3783US12183544B2Tuning voltage setpoint in a pulsed RF signal for a tunable edge sheath systemLAM RES CORP·Filed 2021·Granted Dec 31, 2024·1 cites·24 claims
- 3883US7393432B2RF ground switch for plasma processing systemLAM RES CORP·Filed 2004·Granted Jul 1, 2008·19 cites·17 claims
- 3983US7144521B2High aspect ratio etch using modulation of RF powers of various frequenciesLAM RES CORP·Filed 2003·Granted Dec 5, 2006·24 cites·15 claims
- 4081US12080518B2Impedance match with an elongated RF strapLAM RES CORP·Filed 2021·Granted Sep 3, 2024·1 cites·22 claims
- 4181US2025054730A1Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing SystemLAM RES CORP·Filed 2024·Application pending·0 cites
- 4280US10083853B2Electrostatic chuck design for cooling-gas light-up preventionLAM RES CORP·Filed 2015·Granted Sep 25, 2018·2 cites·18 claims
- 4380US8000082B2Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating sameLAM RES CORP·Filed 2009·Granted Aug 16, 2011·5 cites·19 claims
- 4480US7276135B2Vacuum plasma processor including control in response to DC bias voltageLAM RES CORP·Filed 2004·Granted Oct 2, 2007·16 cites·63 claims
- 4580US2025087458A1Tuning voltage setpoint in a pulsed rf signal for a tunable edge sheath systemLAM RES CORP·Filed 2024·Application pending·0 cites
- 4679US2025253135A1Systems and Methods for Use of Low Frequency Harmonics in Bias Radiofrequency Supply to Control Uniformity of Plasma Process Results Across SubstrateLAM RES CORP·Filed 2025·Application pending·0 cites
- 4778US11069553B2Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformityLAM RES CORP·Filed 2017·Granted Jul 20, 2021·2 cites·16 claims
- 4878US2025062102A1Uniformity control circuit for impedance matchLAM RES CORP·Filed 2024·Application pending·0 cites
- 4977US10916409B2Active control of radial etch uniformityLAM RES CORP·Filed 2018·Granted Feb 9, 2021·2 cites·29 claims
- 5077US2024395504A1Impedance match with an elongated rf strapLAM RES CORP·Filed 2024·Application pending·0 cites
Showing the top 50 of 74 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →