Inventor · disambiguated record
Feiyue Ma
Also filed as: MA FEIYUE
7 granted patents·3 pending applications·15 citations·filing 2016–2020
79Inventor score
Files withAPPLIED MATERIALS INC10
Top patents by PatentIndex Score
10 records- 0186US10256144B2Process integration approach of selective tungsten via fillAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·5 cites·20 claims
- 0282US10395916B2In-situ pre-clean for selectivity improvement for selective depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 27, 2019·3 cites·20 claims
- 0378US10727119B2Process integration approach of selective tungsten via fillAPPLIED MATERIALS INC·Filed 2019·Granted Jul 28, 2020·2 cites·20 claims
- 0477US10854426B2Metal recess for semiconductor structuresAPPLIED MATERIALS INC·Filed 2018·Granted Dec 1, 2020·2 cites·19 claims
- 0576US9947578B2Methods for forming low-resistance contacts through integrated process flow systemsAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·2 cites·19 claims
- 0670US10861676B2Metal recess for semiconductor structuresAPPLIED MATERIALS INC·Filed 2018·Granted Dec 8, 2020·1 cites·19 claims
- 0753US2019385838A1In-Situ Pre-Clean For Selectivity Improvement For Selective DepositionAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 0851US11355391B2Method for forming a metal gapfillAPPLIED MATERIALS INC·Filed 2020·Granted Jun 7, 2022·0 cites·19 claims
- 0938US2018145034A1Methods To Selectively Deposit Corrosion-Free Metal ContactsAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1037US2018144973A1Electromigration Improvement Using Tungsten For Selective Cobalt Deposition On Copper SurfacesAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Feiyue Ma files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →