Inventor · disambiguated record
Flora Fong-Song Chang
Also filed as: CHANG FLORA FONG-SONG
10 granted patents·9 pending applications·28 citations·filing 2017–2025
82Inventor score
Files withAPPLIED MATERIALS INC19
Top patents by PatentIndex Score
19 records- 0197US9923081B1Selective process for source and drain formationAPPLIED MATERIALS INC·Filed 2017·Granted Mar 20, 2018·23 cites·20 claims
- 0293US11261538B1In-situ temperature mapping for epi chamberAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·3 cites·19 claims
- 0380US10276688B2Selective process for source and drain formationAPPLIED MATERIALS INC·Filed 2018·Granted Apr 30, 2019·2 cites·18 claims
- 0479US2025263864A1Method and apparatus for low temperature selective epitaxy in a deep trenchAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0577US12297559B2Method and apparatus for low temperature selective epitaxy in a deep trenchAPPLIED MATERIALS INC·Filed 2022·Granted May 13, 2025·0 cites·22 claims
- 0673US2025096045A1Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0768US2025194193A1Arsenic diffusion profile engineering for transistorsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0866US12249626B2Arsenic diffusion profile engineering for transistorsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 11, 2025·0 cites·20 claims
- 0963US2025231066A1Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1061US12449309B2Methods for detection using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 21, 2025·0 cites·20 claims
- 1161US12165934B2Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Dec 10, 2024·0 cites·18 claims
- 1258US12196617B2Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 14, 2025·0 cites·20 claims
- 1357US2024247405A1Method for controlling layer-to-layer thickness in multi-tier epitaxial processAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1454US11195914B2Transistor and method for forming a transistorAPPLIED MATERIALS INC·Filed 2019·Granted Dec 7, 2021·0 cites·20 claims
- 1554US2018230624A1Method and apparatus for low temperature selective epitaxy in a deep trenchAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1652US2019301011A1Low temperature in-situ cleaning method for epi-chambersAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1752US2023029344A1Methods of formation of a sige/si superlatticeAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1844US10504723B2Method and apparatus for selective epitaxyAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·0 cites·12 claims
- 1938US2017323795A1Method of selective etching on epitaxial film on source/drain area of transistorAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →