Inventor · disambiguated record
Francimar Campana
Also filed as: CAMPANA FRANCIMAR
10 granted patents·2 pending applications·607 citations·filing 1996–2003
92Inventor score
Files withAPPLIED MATERIALS INC12
Top patents by PatentIndex Score
12 records- 0197US6537733B2Method of depositing low dielectric constant silicon carbide layersAPPLIED MATERIALS INC·Filed 2001·Granted Mar 25, 2003·292 cites·90 claims
- 0290US6426015B1Method of reducing undesired etching of insulation due to elevated boron concentrationsAPPLIED MATERIALS INC·Filed 1999·Granted Jul 30, 2002·106 cites·7 claims
- 0385US6218268B1Two-step borophosphosilicate glass deposition process and related devices and apparatusAPPLIED MATERIALS INC·Filed 1998·Granted Apr 17, 2001·80 cites·22 claims
- 0477US7200460B2Method of depositing low dielectric constant silicon carbide layersAPPLIED MATERIALS INC·Filed 2003·Granted Apr 3, 2007·17 cites·20 claims
- 0576US6596343B1Method and apparatus for processing semiconductor substrates with hydroxyl radicalsAPPLIED MATERIALS INC·Filed 2000·Granted Jul 22, 2003·13 cites·8 claims
- 0674US6090206AThrottle valve providing enhanced cleaningAPPLIED MATERIALS INC·Filed 1997·Granted Jul 18, 2000·34 cites·7 claims
- 0769US6855484B2Method of depositing low dielectric constant silicon carbide layersAPPLIED MATERIALS INC·Filed 2003·Granted Feb 15, 2005·10 cites·16 claims
- 0864US6261975B1Method for depositing and planarizing fluorinated BPSG filmsAPPLIED MATERIALS INC·Filed 1999·Granted Jul 17, 2001·27 cites·18 claims
- 0959US6599574B1Method and apparatus for forming a dielectric film using helium as a carrier gasAPPLIED MATERIALS INC·Filed 1996·Granted Jul 29, 2003·25 cites·25 claims
- 1047US2003221621A1Method and apparatus for processing semiconductor substrates with hydroxyl radicalsAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 1136US2002173169A1Two-step flourinated-borophosophosilicate glass deposition processAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 1231US6153540AMethod of forming phosphosilicate glass having a high wet-etch rateAPPLIED MATERIALS INC·Filed 1998·Granted Nov 28, 2000·3 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →