Inventor · disambiguated record
Frank B. Kaufman
Also filed as: KAUFMAN FRANK · KAUFMAN FRANK B · KAUFMAN FRANK BENJAMIN
18 granted patents·1,196 citations·filing 1975–2007
96Inventor score
Files withIBM12CABOT CORP2CABOT MICROELECTRONICS CORP1RENNSSELAER POLYTECHNIC INST1RENSSELAER POLYTECH INST1
Top patents by PatentIndex Score
18 records- 0198US4954142AMethod of chemical-mechanical polishing an electronic component substrate and polishing slurry thereforIBM·Filed 1989·Granted Sep 4, 1990·330 cites·24 claims
- 0296US6126532APolishing pads for a semiconductor substrateCABOT CORP·Filed 1998·Granted Oct 3, 2000·193 cites·18 claims
- 0393US5706067AReflective spatial light modulator arrayIBM·Filed 1997·Granted Jan 6, 1998·138 cites·19 claims
- 0493US4702792AMethod of forming fine conductive lines, patterns and connectorsIBM·Filed 1985·Granted Oct 27, 1987·120 cites·16 claims
- 0591US6062968APolishing pad for a semiconductor substrateCABOT CORP·Filed 1998·Granted May 16, 2000·139 cites·27 claims
- 0688US4142783AReversible electrochromic display device having memoryIBM·Filed 1977·Granted Mar 6, 1979·46 cites·23 claims
- 0786US4036648AHighly conductive printing medium containing a halogenated hydrocarbon photoactivator and a tetrathiafulvalene or a related compound thereofIBM·Filed 1975·Granted Jul 19, 1977·17 cites·11 claims
- 0882US6632377B1Chemical-mechanical planarization of metallurgyIBM·Filed 1999·Granted Oct 14, 2003·70 cites·10 claims
- 0974US6424388B1Reflective spatial light modulator arrayIBM·Filed 1998·Granted Jul 23, 2002·47 cites·26 claims
- 1074US4155866AMethod of controlling silicon wafer etching rates-utilizing a diazine catalyzed etchantIBM·Filed 1978·Granted May 22, 1979·28 cites·12 claims
- 1172US8162723B2Method of polishing a tungsten carbide surfaceSPIRO CLIFFORD·Filed 2007·Granted Apr 24, 2012·6 cites·28 claims
- 1267US7037175B1Method of sharpening cutting edgesCABOT MICROELECTRONICS CORP·Filed 2004·Granted May 2, 2006·12 cites·21 claims
- 1356US4543319APolystyrene-tetrathiafulvalene polymers as deep-ultraviolet mask materialIBM·Filed 1985·Granted Sep 24, 1985·14 cites·19 claims
- 1451US4082552AProcess of optically printing highly conductive character utilizing a medium containing a halogenated hydrocarbon photoactivator and a tetrathiafulvalene or a related compound thereofIBM·Filed 1977·Granted Apr 4, 1978·5 cites·11 claims
- 1550US4360583AHigh resolution video storage diskIBM·Filed 1980·Granted Nov 23, 1982·7 cites·8 claims
- 1647US4877718APositive-working photosensitive polyimide operated by photo induced molecular weight changesRENNSSELAER POLYTECHNIC INST·Filed 1988·Granted Oct 31, 1989·14 cites·6 claims
- 1736US7468766B1Reflective spatial light modulator array including a light blocking layerIBM·Filed 1997·Granted Dec 23, 2008·6 cites·46 claims
- 1836US4886734AElectron-beam positive polyimideRENSSELAER POLYTECH INST·Filed 1988·Granted Dec 12, 1989·4 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →