Inventor · disambiguated record
Francis Ko
Also filed as: KO FRANCIS
16 granted patents·3 pending applications·210 citations·filing 2001–2010
93Inventor score
Top patents by PatentIndex Score
19 records- 0195US7974728B2System for extraction of key process parameters from fault detection classification to enable wafer predictionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Jul 5, 2011·51 cites·14 claims
- 0293US7144297B2Method and apparatus to enable accurate wafer predictionTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Dec 5, 2006·40 cites·16 claims
- 0387US7634325B2Prediction of uniformity of a waferTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Dec 15, 2009·12 cites·18 claims
- 0482US8682466B2Automatic virtual metrology for semiconductor wafer result predictionKO FRANCIS·Filed 2008·Granted Mar 25, 2014·13 cites·17 claims
- 0580US7160671B2Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivityLAM RES CORP·Filed 2001·Granted Jan 9, 2007·19 cites·12 claims
- 0679US8433434B2Near non-adaptive virtual metrology and chamber controlWANG AMY·Filed 2010·Granted Apr 30, 2013·6 cites·20 claims
- 0779US8145337B2Methodology to enable wafer result prediction of semiconductor wafer batch processing equipmentLIN CHUN-HSIEN·Filed 2007·Granted Mar 27, 2012·11 cites·20 claims
- 0877US6559049B2All dual damascene oxide etch process steps in one confined plasma chamberLAM RES CORP·Filed 2002·Granted May 6, 2003·24 cites·18 claims
- 0972US8716867B2Forming interconnect structures using pre-ink-printed sheetsKO FRANCIS·Filed 2010·Granted May 6, 2014·3 cites·19 claims
- 1072US7642100B2Method and system for yield and productivity improvements in semiconductor processingTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 5, 2010·4 cites·29 claims
- 1172US6541361B2Plasma enhanced method for increasing silicon-containing photoresist selectivityLAM RES CORP·Filed 2001·Granted Apr 1, 2003·17 cites·20 claims
- 1271US7851234B2System and method for enhanced control of copper trench sheet resistance uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Dec 14, 2010·4 cites·14 claims
- 1369US7767471B2Auto routing for optimal uniformity controlTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Aug 3, 2010·3 cites·15 claims
- 1465US9037279B2Clustering for prediction models in process control and for optimal dispatchingKO FRANCIS·Filed 2010·Granted May 19, 2015·1 cites·20 claims
- 1564US8409993B2Method and system for controlling copper chemical mechanical polish uniformityKO FRANCIS·Filed 2007·Granted Apr 2, 2013·2 cites·9 claims
- 1648US2007072095A1Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivityLAM RES CORP·Filed 2006·Application pending·0 cites
- 1741US2006129257A1Novel method and apparatus for integrating fault detection and real-time virtual metrology in an advanced process control frameworkTAIWAN SEMICONDUCTOR MFG·Filed 2004·Application pending·0 cites
- 1838US6799907B2Plasma enhanced method for increasing silicon-containing photoresist selectivityLAM RES CORP·Filed 2003·Granted Oct 5, 2004·0 cites·12 claims
- 1934US2005186753A1FIB exposure of alignment marks in MIM technologyFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →