Inventor · disambiguated record
Fufa Chen
Also filed as: CHEN FUFA
27 granted patents·3 pending applications·639 citations·filing 1997–2023
96Inventor score
Top patents by PatentIndex Score
30 records- 0198US6364949B1300 mm CVD chamber design for metal-organic thin film depositionAPPLIED MATERIALS INC·Filed 1999·Granted Apr 2, 2002·424 cites·33 claims
- 0290US11581205B2Methods and system for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2021·Granted Feb 14, 2023·2 cites·42 claims
- 0386US11141762B2System for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2017·Granted Oct 12, 2021·3 cites·42 claims
- 0483US6220091B1Liquid level pressure sensor and methodAPPLIED MATERIALS INC·Filed 1997·Granted Apr 24, 2001·53 cites·20 claims
- 0581US11911808B2System for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2023·Granted Feb 27, 2024·0 cites·40 claims
- 0680US6436820B1Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 ÅAPPLIED MATERIALS INC·Filed 2000·Granted Aug 20, 2002·31 cites·26 claims
- 0778US11037804B2Methods and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2016·Granted Jun 15, 2021·2 cites·33 claims
- 0877US11257667B2Methods and apparatus for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2016·Granted Feb 22, 2022·2 cites·27 claims
- 0976US6660135B2Staged aluminum deposition process for filling viasAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·21 cites·35 claims
- 1075US11633765B2System for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2021·Granted Apr 25, 2023·0 cites·14 claims
- 1175US6179277B1Liquid vaporizer systems and methods for their useAPPLIED MATERIALS INC·Filed 1998·Granted Jan 30, 2001·33 cites·18 claims
- 1274US10910244B2Methods and system for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2015·Granted Feb 2, 2021·2 cites·35 claims
- 1370US11967497B2Methods and apparatus for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2022·Granted Apr 23, 2024·0 cites·16 claims
- 1465US8671961B2Methods and apparatus for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2013·Granted Mar 18, 2014·1 cites·9 claims
- 1565US6352620B2Staged aluminum deposition process for filling viasAPPLIED MATERIALS INC·Filed 1999·Granted Mar 5, 2002·27 cites·28 claims
- 1664US11848217B2Methods and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2021·Granted Dec 19, 2023·0 cites·37 claims
- 1764US11638937B2Methods and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2021·Granted May 2, 2023·0 cites·52 claims
- 1861US8580042B2Methods and apparatus for cleaning semiconductor wafersNUCH VOHA·Filed 2007·Granted Nov 12, 2013·2 cites·24 claims
- 1960US12111575B2Coater with automatic cleaning function and coater automatic cleaning methodACM RESEARCH SHANGHAI INC·Filed 2020·Granted Oct 8, 2024·0 cites·14 claims
- 2060US11752529B2Method for cleaning semiconductor wafersACM RESEARCH SHANGHAI INC·Filed 2017·Granted Sep 12, 2023·0 cites·23 claims
- 2155US10816901B2Coater with automatic cleaning function and coater automatic cleaning methodACM RESEARCH SHANGHAI INC·Filed 2014·Granted Oct 27, 2020·0 cites·11 claims
- 2251US11103898B2Methods and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2016·Granted Aug 31, 2021·0 cites·43 claims
- 2350US6086676AProgrammable electrical interlock system for a vacuum processing systemAPPLIED MATERIALS INC·Filed 1997·Granted Jul 11, 2000·15 cites·16 claims
- 2448US6221174B1Method of performing titanium/titanium nitride integrationAPPLIED MATERIALS INC·Filed 1999·Granted Apr 24, 2001·15 cites·22 claims
- 2547US6332601B1Liquid vaporizers for semiconductor processing systemsAPPLIED MATERIALS INC·Filed 2000·Granted Dec 25, 2001·6 cites·22 claims
- 2646US11911807B2Method and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2018·Granted Feb 27, 2024·0 cites·11 claims
- 2739US2021035821A1Methods and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2018·Application pending·0 cites
- 2839US2021031243A1Methods and apparatus for cleaning substratesACM RESEARCH SHANGHAI INC·Filed 2018·Application pending·0 cites
- 2936US2002114886A1Method of tisin deposition using a chemical vapor deposition processAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 3035US10770335B2Substrate supporting apparatusACM RESEARCH SHANGHAI INC·Filed 2016·Granted Sep 8, 2020·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →