Inventor · disambiguated record
Fumihiko Fukunaga
Also filed as: FUKUNAGA FUMIHIKO
12 granted patents·1 pending application·32 citations·filing 1996–2017
87Inventor score
Files withHITACHI HIGH TECH CORP8FUKUNAGA FUMIHIKO1HARADA MINORU1HIROI TAKASHI1KONISHIROKU PHOTO IND1
Top patents by PatentIndex Score
13 records- 0188US9858659B2Pattern inspecting and measuring device and programHITACHI HIGH TECH CORP·Filed 2013·Granted Jan 2, 2018·9 cites·16 claims
- 0279US9165356B2Defect inspection method and defect inspection deviceHARADA MINORU·Filed 2012·Granted Oct 20, 2015·4 cites·20 claims
- 0375US10720307B2Electron microscope device and inclined hole measurement method using sameHITACHI HIGH TECH CORP·Filed 2017·Granted Jul 21, 2020·2 cites·18 claims
- 0475US9390885B2Superposition measuring apparatus, superposition measuring method, and superposition measuring systemHITACHI HIGH TECH CORP·Filed 2014·Granted Jul 12, 2016·3 cites·12 claims
- 0574US10712152B2Overlay error measurement device and computer programHITACHI HIGH TECH CORP·Filed 2016·Granted Jul 14, 2020·2 cites·8 claims
- 0672US10783625B2Method for measuring overlay and measuring apparatus, scanning electron microscope, and GUIHITACHI HIGH TECH CORP·Filed 2017·Granted Sep 22, 2020·1 cites·8 claims
- 0767US10094658B2Overlay measurement method, device, and display deviceHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 9, 2018·2 cites·19 claims
- 0867US9342878B2Charged particle beam apparatusYAMAGUCHI KOHEI·Filed 2011·Granted May 17, 2016·2 cites·14 claims
- 0965US9799112B2Method for measuring overlay and measuring apparatus, scanning electron microscope, and GUIHITACHI HIGH TECH CORP·Filed 2013·Granted Oct 24, 2017·1 cites·19 claims
- 1065US8111902B2Method and apparatus for inspecting defects of circuit patternsHIROI TAKASHI·Filed 2006·Granted Feb 7, 2012·4 cites·12 claims
- 1144US2006284088A1Focus correction method for inspection of circuit patternsFUKUNAGA FUMIHIKO·Filed 2006·Application pending·0 cites
- 1239US10996569B2Measurement device, method and display deviceHITACHI HIGH TECH CORP·Filed 2016·Granted May 4, 2021·0 cites·14 claims
- 1329US5845054AMethod and apparatus for determining a correction pattern of periodical unevenness of an apparatus in which optical beams are reflected by a rotating polygonal mirror and scan a recording bodyKONISHIROKU PHOTO IND·Filed 1996·Granted Dec 1, 1998·2 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →