Inventor · disambiguated record
Fumiyuki Nishiyama
Also filed as: NISHIYAMA FUMIYUKI
17 granted patents·6 pending applications·129 citations·filing 1993–2012
93Inventor score
Top patents by PatentIndex Score
23 records- 0193US7998654B2Positive resist composition and pattern-forming methodFUJIFILM CORP·Filed 2008·Granted Aug 16, 2011·16 cites·14 claims
- 0286US8012665B2Positive photosensitive composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Sep 6, 2011·7 cites·24 claims
- 0386US7592126B2Positive resist composition and pattern forming method using the resist compositionFUJIFILM CORP·Filed 2006·Granted Sep 22, 2009·9 cites·7 claims
- 0485US6376152B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Apr 23, 2002·24 cites·20 claims
- 0584US7811740B2Positive resist composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2005·Granted Oct 12, 2010·6 cites·16 claims
- 0679US6537718B2Positive photoresist composition for exposure to far ultraviolet rayFUJI PHOTO FILM CO LTD·Filed 2000·Granted Mar 25, 2003·18 cites·15 claims
- 0778US7326516B2Resist composition for immersion exposure and pattern formation method using the sameFUJIFILM CORP·Filed 2005·Granted Feb 5, 2008·7 cites·9 claims
- 0876US8241833B2Positive resist composition and pattern-forming method using the sameKANDA HIROMI·Filed 2010·Granted Aug 14, 2012·2 cites·8 claims
- 0964US9122151B2Resist composition, resist film therefrom and method of forming negative pattern using the compositionFUJII KANA·Filed 2012·Granted Sep 1, 2015·1 cites·12 claims
- 1062US6756179B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Jun 29, 2004·17 cites·16 claims
- 1154US7465528B2Positive-working photosensitive composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Dec 16, 2008·4 cites·9 claims
- 1252US6692883B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 17, 2004·3 cites·19 claims
- 1351US8753792B2Positive photosensitive composition and pattern forming method using the sameKODAMA KUNIHIKO·Filed 2010·Granted Jun 17, 2014·0 cites·26 claims
- 1447US5358824APhotosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ringFUJI PHOTO FILM CO LTD·Filed 1993·Granted Oct 25, 1994·9 cites·1 claims
- 1546US6727033B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Apr 27, 2004·1 cites·17 claims
- 1646US2008081289A1Resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 1745US2008081292A1Resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 1845US2008050675A1Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 1945US2008096134A1Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 2044US2007072118A1Positive photosensitive composition and pattern forming method using the sameFUJI PHOTO FILM CO LTD·Filed 2006·Application pending·0 cites
- 2143US7122589B2Positive resist composition and pattern formation method using the sameFUJI PHOTO FILM CO LTD·Filed 2003·Granted Oct 17, 2006·5 cites·14 claims
- 2236US2003054287A1Resist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Application pending·0 cites
- 2333US8945810B2Positive resist composition and pattern-forming methodNISHIYAMA FUMIYUKI·Filed 2011·Granted Feb 3, 2015·0 cites·34 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →