Inventor · disambiguated record
Gaëlle Antoun
Also filed as: ANTOUN GAËLLE
3 granted patents·0 citations·filing 2018–2021
40Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD3
Top patents by PatentIndex Score
3 records- 0155US12131914B2Selective etching with fluorine, oxygen and noble gas containing plasmasTOKYO ELECTRON LTD·Filed 2021·Granted Oct 29, 2024·0 cites·20 claims
- 0253US12249515B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Mar 11, 2025·0 cites·16 claims
- 0347US11120999B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Sep 14, 2021·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →