Inventor · disambiguated record
Geetika Bajaj
Also filed as: BAJAJ GEETIKA
19 granted patents·23 pending applications·19 citations·filing 2014–2025
89Inventor score
Files withAPPLIED MATERIALS INC42
Top patents by PatentIndex Score
42 records- 0193US9991129B1Selective etching of amorphous silicon over epitaxial siliconAPPLIED MATERIALS INC·Filed 2017·Granted Jun 5, 2018·9 cites·15 claims
- 0287US10074559B1Selective poreseal deposition prevention and residue removal using SAMAPPLIED MATERIALS INC·Filed 2017·Granted Sep 11, 2018·5 cites·17 claims
- 0381US12497692B2Halogen resistant coatings and methods of making and using thereofAPPLIED MATERIALS INC·Filed 2023·Granted Dec 16, 2025·0 cites·19 claims
- 0481US11359282B2Methods for forming impurity free metal alloy filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·1 cites·10 claims
- 0580US11540432B2Ultrathin conformal coatings for electrostatic dissipation in semiconductor process toolsAPPLIED MATERIALS INC·Filed 2020·Granted Dec 27, 2022·1 cites·20 claims
- 0678US12004337B2Ultrathin conformal coatings for electrostatic dissipation in semiconductor process toolsAPPLIED MATERIALS INC·Filed 2022·Granted Jun 4, 2024·0 cites·19 claims
- 0776US2024287678A1Methods for forming impurity free metal alloy filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0873US10573527B2Gas-phase selective etching systems and methodsAPPLIED MATERIALS INC·Filed 2019·Granted Feb 25, 2020·1 cites·20 claims
- 0971US11639547B2Halogen resistant coatings and methods of making and using thereofAPPLIED MATERIALS INC·Filed 2019·Granted May 2, 2023·0 cites·20 claims
- 1068US11547030B2Ultrathin conformal coatings for electrostatic dissipation in semiconductor process toolsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·0 cites·20 claims
- 1168US10233554B2Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·1 cites·19 claims
- 1267US2022267904A1Methods for forming impurity free metal alloy filmsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1365US2023355536A1Ozone-based low temperature silicon oxide coating for pharmaceutical applicationsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1464US2023416909A1Method for formation of conformal ald sio2 filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1561US12322592B2Deposition of silicon-based dielectric filmsAPPLIED MATERIALS INC·Filed 2022·Granted Jun 3, 2025·0 cites·18 claims
- 1661US9257330B2Ultra-thin structure to protect copper and method of preparationAPPLIED MATERIALS INC·Filed 2014·Granted Feb 9, 2016·1 cites·20 claims
- 1761US2024026527A1Method of depositing silicon based dielectric filmAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1860US11976357B2Methods for forming a protective coating on processing chamber surfaces or componentsAPPLIED MATERIALS INC·Filed 2019·Granted May 7, 2024·0 cites·11 claims
- 1958US12272607B2Method of enhancing contrast while imaging high aspect ratio structures in electron microscopyAPPLIED MATERIALS INC·Filed 2020·Granted Apr 8, 2025·0 cites·20 claims
- 2057US2024360557A1Halide and organic precursors for metal depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2156US2024145242A1Method of blocking dielectric surfaces using blocking molecules to enable selective epi depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2256US2025230544A1Diethyl zinc and metal halide precursors for deposition of metal films on semiconductor substratesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2354US10253406B2Method for forming yttrium oxide on semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·0 cites·19 claims
- 2453US11390947B2Method of forming a fluorinated metal filmAPPLIED MATERIALS INC·Filed 2020·Granted Jul 19, 2022·0 cites·18 claims
- 2553US2025126867A1Interfacial layer scaling processes for semiconductor devicesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2652US10886137B2Selective nitride removalAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·0 cites·17 claims
- 2752US2023420486A1Atomic layer deposition of high dielectric constant materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2852US2019301011A1Low temperature in-situ cleaning method for epi-chambersAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2951US2024145230A1Semiconductor cleaning using plasma-free precursorsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3051US2018347039A1Aerosol Assisted CVD For Industrial CoatingsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 3150US2024266414A1Multi-vt integration scheme for semiconductor devicesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3249US2024222195A1Dipole formation processesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3348US2025285867A1Work function layer for pmos stackAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3448US2024363723A1Multi-threshold voltage integration scheme for semiconductor devicesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3547US10497573B2Selective atomic layer etching of semiconductor materialsAPPLIED MATERIALS INC·Filed 2018·Granted Dec 3, 2019·0 cites·20 claims
- 3646US10177002B2Methods for chemical etching of siliconAPPLIED MATERIALS INC·Filed 2017·Granted Jan 8, 2019·0 cites·20 claims
- 3745US2016172238A1Selective sealant removalAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3844US2022277936A1Protective multilayer coating for processing chamber componentsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3940US2018308685A1Low temperature selective epitaxial silicon depositionAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4039US2018350604A1Selective Deposition And Etching Of Metal Pillars Using AACVD And An Electrical BiasAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4136US2018080124A1Methods and systems for thermal ale and aldAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4235US2018374706A1Corrosion resistant coating for semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Geetika Bajaj files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →