Inventor · disambiguated record
George M. Gammel
Also filed as: GAMMEL GEORGE · GAMMEL GEORGE M · GAMMEL GEORGE MICHAEL
16 granted patents·4 pending applications·97 citations·filing 1991–2022
92Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT12APPLIED MATERIALS INC3VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3DZENGELESKI JOSEPH P1US ENERGY1
Top patents by PatentIndex Score
20 records- 0190US8853653B1Apparatus and techniques for controlling ion implantation uniformityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Oct 7, 2014·6 cites·16 claims
- 0289US8378318B1Fixed mask design improvementsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2011·Granted Feb 19, 2013·9 cites·20 claims
- 0383US7663125B2Ion beam current uniformity monitor, ion implanter and related methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Feb 16, 2010·8 cites·18 claims
- 0483US6723998B2Faraday system for ion implantersVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted Apr 20, 2004·25 cites·17 claims
- 0580US6528804B1Method and apparatus for low energy ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2000·Granted Mar 4, 2003·16 cites·17 claims
- 0674US9062377B2Reducing glitching in an ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jun 23, 2015·3 cites·18 claims
- 0772US6891173B2Ion implantation systems and methods utilizing a downstream gas sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted May 10, 2005·11 cites·31 claims
- 0871US7723706B2Horizontal and vertical beam angle measurement techniqueVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted May 25, 2010·3 cites·18 claims
- 0969US7476877B2Wafer charge monitoringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Jan 13, 2009·2 cites·20 claims
- 1068US10431421B2Apparatus and techniques for beam mapping in ion beam systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Oct 1, 2019·1 cites·8 claims
- 1166US9738968B2Apparatus and method for controlling implant processVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Aug 22, 2017·1 cites·18 claims
- 1264US9006692B2Apparatus and techniques for controlling ion implantation uniformityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Apr 14, 2015·1 cites·14 claims
- 1359US12482709B2Fast beam calibration procedure for beamline ion implanterAPPLIED MATERIALS INC·Filed 2022·Granted Nov 25, 2025·0 cites·19 claims
- 1456US12191113B2Systems and methods for optimizing full horizontal scanned beam distanceAPPLIED MATERIALS INC·Filed 2022·Granted Jan 7, 2025·0 cites·20 claims
- 1555US2020027698A1Apparatus and techniques for beam mapping in ion beam systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Application pending·0 cites
- 1654US11264205B2Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substratesAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·0 cites·18 claims
- 1747US2010159120A1Plasma ion process uniformity monitorVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 1846US5153430AMethod and apparatus for measuring the momentum, energy, power, and power density profile of intense particle beamsUS ENERGY·Filed 1991·Granted Oct 6, 1992·11 cites·20 claims
- 1944US2014127394A1Reducing Glitching In An Ion ImplanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Application pending·0 cites
- 2038US2012021136A1System and method for controlling plasma deposition uniformityDZENGELESKI JOSEPH P·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →