Inventor · disambiguated record
Geongon Lee
Also filed as: LEE GEONGON
4 granted patents·13 pending applications·0 citations·filing 2022–2023
52Inventor score
Top patents by PatentIndex Score
17 records- 0163US12455501B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Oct 28, 2025·0 cites·15 claims
- 0262US2023193043A1Method of preparing laminate and laminate for optical useSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 0361US2024061324A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 0460US2023418150A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 0558US12487517B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Dec 2, 2025·0 cites·18 claims
- 0658US2023305382A1Photomask for extreme ultravioletSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 0757US2023213849A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 0857US2023408903A1Shadow mask and method of manufacturing blank mask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 0956US2023185185A1Method and apparatus for forming a blank mask and a layer for a blank maskSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1055US12461439B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·18 claims
- 1155US2023135037A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1255US2023110529A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1354US2023064333A1Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1453US2022397819A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1551US2024192584A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Application pending·0 cites
- 1649US12276905B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·9 claims
- 1747US2022350238A1Photomask blank, photomask, and manufacturing method of semiconductor elementSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →