Inventor · disambiguated record
George Liu
Also filed as: LIU GEORGE · LIU GEORGE S
27 granted patents·9 pending applications·898 citations·filing 1994–2016
96Inventor score
Files withLIU GEORGE9UNITED MICROELECTRONICS CORP7TAIWAN SEMICONDUCTOR MFG6ERICSSON TELEFON AB L M3EVERMARK LLC3
Top patents by PatentIndex Score
36 records- 0197US5825759ADistributing network services and resources in a mobile communications networkERICSSON TELEFON AB L M·Filed 1995·Granted Oct 20, 1998·523 cites·37 claims
- 0290US8431291B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Apr 30, 2013·5 cites·16 claims
- 0389US7432042B2Immersion lithography process and mask layer structure applied in the sameUNITED MICROELECTRONICS CORP·Filed 2003·Granted Oct 7, 2008·34 cites·7 claims
- 0489US5572221AMethod and apparatus for detecting and predicting motion of mobile terminalsERICSSON TELEFON AB L M·Filed 1994·Granted Nov 5, 1996·235 cites·35 claims
- 0581US8846302B2Semiconductor structure and method and tool for forming the semiconductor structureLIU GEORGE·Filed 2012·Granted Sep 30, 2014·5 cites·19 claims
- 0679US8394576B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2012·Granted Mar 12, 2013·2 cites·20 claims
- 0777US7648918B2Method of pattern formation in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jan 19, 2010·4 cites·18 claims
- 0876US8124323B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2007·Granted Feb 28, 2012·4 cites·20 claims
- 0976US8003303B2Intensity selective exposure method and apparatusTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Aug 23, 2011·4 cites·18 claims
- 1074US8119533B2Pattern formation in semiconductor fabricationLIU GEORGE·Filed 2009·Granted Feb 21, 2012·3 cites·20 claims
- 1174US7642101B2Semiconductor device having in-chip critical dimension and focus patternsTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 5, 2010·4 cites·14 claims
- 1270US8673520B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Mar 18, 2014·1 cites·19 claims
- 1368US7838205B2Utilization of electric field with isotropic development in photolithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Nov 23, 2010·2 cites·18 claims
- 1467US10262222B2Method and system for measuring dimensions of a target objectSICK INC·Filed 2016·Granted Apr 16, 2019·2 cites·17 claims
- 1567US7387969B2Top patterned hardmask and method for patterningTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jun 17, 2008·2 cites·14 claims
- 1666US7818926B2Doorjamb end cap and method of installation thereforEVERMARK LLC·Filed 2006·Granted Oct 26, 2010·3 cites·15 claims
- 1766US6396828B1Arrangement system and method relating to data network accessERICSSON TELEFON AB L M·Filed 1998·Granted May 28, 2002·55 cites·37 claims
- 1862US6844143B2Sandwich photoresist structure in photolithographic processUNITED MICROELECTRONICS CORP·Filed 2002·Granted Jan 18, 2005·8 cites·7 claims
- 1959US8815496B2Method for patterning a photosensitive layerTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 26, 2014·0 cites·20 claims
- 2055US8623231B2Method for etching an ultra thin filmLIU GEORGE·Filed 2008·Granted Jan 7, 2014·0 cites·17 claims
- 2153US2006123720A1Fiberglass cover for a door frame componentEVERMARK LLC·Filed 2006·Application pending·0 cites
- 2253US2008153012A1Method of measuring the overlay accuracy of a multi-exposure processUNITED MICROELECTRONICS CORP·Filed 2008·Application pending·0 cites
- 2350US7268070B2Profile improvement method for patterningUNITED MICROELECTRONICS CORP·Filed 2003·Granted Sep 11, 2007·2 cites·13 claims
- 2449US2009151289A1JointLNL BUILDING PRODUCTS INC·Filed 2007·Application pending·0 cites
- 2547US8472005B2Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabricationLIU GEORGE·Filed 2007·Granted Jun 25, 2013·0 cites·19 claims
- 2647US7222468B2Doorjamb end cap and method of installation thereforLIU GEORGE·Filed 2003·Granted May 29, 2007·0 cites·17 claims
- 2747US2015135618A1Environmentally resistant structural memberLIU GEORGE S·Filed 2013·Application pending·0 cites
- 2845US9091923B2Contrast enhancing exposure system and method for use in semiconductor fabricationLIU GEORGE·Filed 2007·Granted Jul 28, 2015·0 cites·10 claims
- 2944US8716139B2Method of patterning a semiconductor deviceLIU GEORGE·Filed 2012·Granted May 6, 2014·0 cites·20 claims
- 3043US2006096191A1Maintenance free jambEVERMARK LLC·Filed 2004·Application pending·0 cites
- 3142US9070623B2Controlling gate formation for high density cell layoutCHUANG HARRY-HAK-LAY·Filed 2010·Granted Jun 30, 2015·0 cites·18 claims
- 3242US2005244729A1Method of measuring the overlay accuracy of a multi-exposure processUNITED MICROELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 3339US8237297B2System and method for providing alignment mark for high-k metal gate processCHEN KUEI SHUN·Filed 2010·Granted Aug 7, 2012·0 cites·20 claims
- 3438US2004166448A1Method for shrinking the image of photoresistUNITED MICROELECTRONICS CORP·Filed 2003·Application pending·0 cites
- 3537US2004166447A1Method for shrinking pattern photoresistFiled 2003·Application pending·0 cites
- 3636US2004075179A1Structural design of alignment markUNITED MICROELECTRONICS CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →