Inventor · disambiguated record
Georg Pawlowski
Also filed as: PAWLOWSKI GEORG
70 granted patents·3 pending applications·1,424 citations·filing 1985–2015
99Inventor score
Files withHOECHST AG43HOECHST JAPAN7CLARIANT FINANCE BVI LTD6AZ ELECTRONIC MAT (LUXEMBOURG) S A R L3AZ ELECTRONIC MATERIALS USA2
Top patents by PatentIndex Score
73 records- 0195US5055579AHeterocyclic compounds containing 4,6-bis-trichloromethyl-s-triazin-2-ly groupsHOECHST AG·Filed 1989·Granted Oct 8, 1991·84 cites·8 claims
- 0292US4940646APolyvinyl acetal with hydroxy aliphatic acetal groups useful in photosensitive negative working compositionsHOECHST AG·Filed 1987·Granted Jul 10, 1990·92 cites·9 claims
- 0391US6358665B1Radiation-sensitive composition of chemical amplification typeCLARIANT INT LTD·Filed 1999·Granted Mar 19, 2002·125 cites·42 claims
- 0491US4760006A2,3-bis(dialkylaminophenyl)quinoxalines and their use in electrophotographic recording materialsHOECHST AG·Filed 1985·Granted Jul 26, 1988·39 cites·11 claims
- 0590US7601482B2Negative photoresist compositionsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 13, 2009·16 cites·23 claims
- 0689US5525453APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1994·Granted Jun 11, 1996·61 cites·20 claims
- 0788US6737492B2Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted May 18, 2004·28 cites·15 claims
- 0887US6803168B1Composition for anti-reflective coating or radiation absorbing coating and compounds used in the compositionCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 12, 2004·55 cites·27 claims
- 0987US4631245APhotosensitive composition admixture of a diazonium salt polycondensation product and polymeric binder with carboxyl side chain groupsHOECHST AG·Filed 1985·Granted Dec 23, 1986·44 cites·18 claims
- 1084US6277750B1Composition for bottom reflection preventive film and novel polymeric dye for use in the sameCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 21, 2001·48 cites·18 claims
- 1184US5716756ASulfonic acid esters, radiation-sensitive mixtures prepared therewith and their useHOECHST AG·Filed 1993·Granted Feb 10, 1998·29 cites·17 claims
- 1282US5338641APositive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compoundHOECHST AG·Filed 1993·Granted Aug 16, 1994·39 cites·25 claims
- 1381US7816071B2Process of imaging a photoresist with multiple antireflective coatingsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 19, 2010·19 cites·22 claims
- 1481US4956261APhotosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layerHOECHST AG·Filed 1989·Granted Sep 11, 1990·32 cites·17 claims
- 1580US5314786APositive-working radiation sensitive mixture comprising sulfonic acid esters of 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine, and recording material containing these estersHOECHST AG·Filed 1992·Granted May 24, 1994·20 cites·20 claims
- 1679US6329117B1Antireflection or light-absorbing coating composition and polymer thereforCLARIANT INT LTD·Filed 1998·Granted Dec 11, 2001·60 cites·26 claims
- 1779US5326840ARadiation-sensitive mixture containing novel polymers embodying units composed of amides of α, β-unsaturated carboxylic acids as bindersHOECHST AG·Filed 1992·Granted Jul 5, 1994·48 cites·18 claims
- 1875US9810988B2Composition for forming overlay film, and resist pattern formation method employing the sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Nov 7, 2017·1 cites·15 claims
- 1975US5498506APositive-acting radiation-sensitive mixture and recording material produced therewithHOECHST AG·Filed 1993·Granted Mar 12, 1996·32 cites·19 claims
- 2075US5354643AOligomeric compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtureHOECHST AG·Filed 1992·Granted Oct 11, 1994·30 cites·17 claims
- 2175US5340682APositive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compoundHOECHST AG·Filed 1993·Granted Aug 23, 1994·29 cites·21 claims
- 2275US5286867ASubstituted 1-sulfonyloxy-2-pyridones and process for preparing themHOECHST AG·Filed 1992·Granted Feb 15, 1994·16 cites·19 claims
- 2373US5852128AAcid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materialsCLARIANT AG·Filed 1997·Granted Dec 22, 1998·31 cites·8 claims
- 2471US5776658ASilicone-compatible photoinitiators, and photosensitive mixtures comprising themAGFA GEVAERT AG·Filed 1995·Granted Jul 7, 1998·28 cites·21 claims
- 2571US4996301APolyfunctional α-diazo-β-keto esters and their use in light-sensitive compositionsHOECHST AG·Filed 1990·Granted Feb 26, 1991·10 cites·30 claims
- 2668US5230985ANegative-working radiation-sensitive mixtures, and radiation-sensitive recording material produced with these mixturesHOECHST AG·Filed 1992·Granted Jul 27, 1993·22 cites·20 claims
- 2768US5227276ANegative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Jul 13, 1993·21 cites·20 claims
- 2867US6284427B1Process for preparing resistsCLARIANT FINANCE BVI LTD·Filed 1998·Granted Sep 4, 2001·18 cites·27 claims
- 2966US9482952B2Composition for forming topcoat layer and resist pattern formation method employing the sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 1, 2016·1 cites·10 claims
- 3066US6686121B2Process for preparing resistsCLARIANT FINANCE BVI LTD·Filed 2001·Granted Feb 3, 2004·6 cites·7 claims
- 3166US5424166ANegative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfromHOECHST AG·Filed 1994·Granted Jun 13, 1995·21 cites·26 claims
- 3265US5286602AAcid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Feb 15, 1994·8 cites·20 claims
- 3364US5595855ARadiation sensitive compositionHOECHST JAPAN·Filed 1995·Granted Jan 21, 1997·24 cites·18 claims
- 3464US5364734APostive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewithHOECHST AG·Filed 1992·Granted Nov 15, 1994·19 cites·21 claims
- 3562US5541036ANegative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resinHOECHST JAPAN·Filed 1993·Granted Jul 30, 1996·17 cites·12 claims
- 3662US5401608ANegative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewithHOECHST AG·Filed 1992·Granted Mar 28, 1995·17 cites·19 claims
- 3762US5328973ARadiation-sensitive mixture with a polymeric binder containing units of α,β-unsaturated carboxamidesHOECHST AG·Filed 1992·Granted Jul 12, 1994·14 cites·21 claims
- 3861US5326826ARadiation-sensitive polymers containing diazocarbonyl groups and a process for their preparationHOECHST AG·Filed 1992·Granted Jul 5, 1994·16 cites·46 claims
- 3961US5229254APositive-working radiation-sensitive mixtures, and radiation-sensitive recording materials produced with these mixturesHOECHST AG·Filed 1992·Granted Jul 20, 1993·17 cites·20 claims
- 4060US9298095B2Rinse solution for lithography and pattern formation method employing the sameWANG XIAOWEI·Filed 2012·Granted Mar 29, 2016·1 cites·17 claims
- 4160US5346806AAcid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixtureHOECHST AG·Filed 1992·Granted Sep 13, 1994·7 cites·20 claims
- 4258US5843319APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1997·Granted Dec 1, 1998·16 cites·12 claims
- 4356US6468718B1Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 22, 2002·14 cites·10 claims
- 4456US5738972ARadiation sensitive compositionHOECHST JAPAN·Filed 1997·Granted Apr 14, 1998·21 cites·19 claims
- 4554US5191069APolyfunctional compounds containing α-diazo-β-keto ester units and sulfonate unitsHOECHST AG·Filed 1991·Granted Mar 2, 1993·5 cites·42 claims
- 4654US5064959AAromatic compounds substituted by 4,6-bis(trichloromethyl)-s-triazin-2-yl groupsHOECHST AG·Filed 1989·Granted Nov 12, 1991·11 cites·17 claims
- 4753US5198322APositively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixtureHOECHST AG·Filed 1990·Granted Mar 30, 1993·10 cites·37 claims
- 4852US9804493B2Composition for forming topcoat layer and resist pattern formation method employing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Oct 31, 2017·0 cites·10 claims
- 4950US9505721B2Aromatic imide compound and method for producing sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Nov 29, 2016·0 cites·15 claims
- 5049US4859795AEthylenically unsaturated phosphinic acid and thiophosphinic acid isocyanates and isothiocyanates, and a process for their preparationHOECHST AG·Filed 1987·Granted Aug 22, 1989·3 cites·10 claims
Showing the top 50 of 73 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →