Inventor · disambiguated record
Gen Tamamushi
Also filed as: TAMAMUSHI GEN
10 granted patents·8 pending applications·8 citations·filing 2018–2024
80Inventor score
Files withTOKYO ELECTRON LTD18
Top patents by PatentIndex Score
18 records- 0191US11227773B2Method for controlling electrostatic chuck and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jan 18, 2022·3 cites·11 claims
- 0289US12087591B2Plasma processing apparatus and systemTOKYO ELECTRON LTD·Filed 2022·Granted Sep 10, 2024·1 cites·18 claims
- 0387US12125679B2Plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Oct 22, 2024·1 cites·11 claims
- 0487US11443924B2Upper electrode and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 13, 2022·2 cites·15 claims
- 0583US12057294B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 6, 2024·1 cites·5 claims
- 0663US2024355584A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0761US2022093407A1Method for Controlling Electrostatic Attractor and Plasma Processing ApparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0860US12476080B2Plasma processing apparatus, power supply system, control method, program, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Granted Nov 18, 2025·0 cites·20 claims
- 0960US2023369019A1Plasma processing apparatus and method for controlling source frequency of source radio-frequency powerTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1059US11315793B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Apr 26, 2022·0 cites·23 claims
- 1157US2024170258A1Plasma processing system and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1257US2024153742A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1352US2022406568A1Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1446US11984303B2Holding method of edge ring, plasma processing apparatus, and substrate processing systemTOKYO ELECTRON LTD·Filed 2021·Granted May 14, 2024·0 cites·15 claims
- 1545US2020312623A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1642US10943766B2Power feed member and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Mar 9, 2021·0 cites·11 claims
- 1742US10886135B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jan 5, 2021·0 cites·12 claims
- 1841US2019164726A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →