Inventor · disambiguated record
Gerbrand Van Der Zouw
Also filed as: VAN DER ZOUW GERBRAND
20 granted patents·90 citations·filing 2004–2020
93Inventor score
Top patents by PatentIndex Score
20 records- 0195US8921814B2Photon source, metrology apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Dec 30, 2014·28 cites·20 claims
- 0294US8553218B2Calibration method and apparatusTINNEMANS PATRICIUS ALOYSIUS JACOBUS·Filed 2010·Granted Oct 8, 2013·18 cites·22 claims
- 0393US10126237B2Inspection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Nov 13, 2018·7 cites·19 claims
- 0488US9357626B2Photon source, metrology apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted May 31, 2016·7 cites·20 claims
- 0587US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 0687US10191391B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 29, 2019·4 cites·19 claims
- 0786US10795269B2Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Oct 6, 2020·3 cites·15 claims
- 0882US10534274B2Method of inspecting a substrate, metrology apparatus, and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Jan 14, 2020·2 cites·18 claims
- 0982US10437159B2Measurement system, lithographic system, and method of measuring a targetASML NETHERLANDS BV·Filed 2017·Granted Oct 8, 2019·2 cites·20 claims
- 1079US10303064B2Radiation conditioning system, illumination system and metrology apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted May 28, 2019·2 cites·20 claims
- 1178US10338401B2Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Jul 2, 2019·2 cites·21 claims
- 1277US10551308B2Focus control arrangement and methodASML NETHERLANDS BV·Filed 2016·Granted Feb 4, 2020·1 cites·20 claims
- 1372US9753296B2Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Sep 5, 2017·1 cites·20 claims
- 1466US7409302B2Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatusASML NETHERLANDS BV·Filed 2005·Granted Aug 5, 2008·6 cites·18 claims
- 1563US10423077B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2018·Granted Sep 24, 2019·0 cites·18 claims
- 1654US12460971B2Wavelength selection module, illumination system and metrology systemASML NETHERLANDS BV·Filed 2020·Granted Nov 4, 2025·0 cites·17 claims
- 1752US6891598B2Lithographic device and method for wafer alignment with reduced tilt sensitivityASML NETHERLANDS BV·Filed 2004·Granted May 10, 2005·3 cites·26 claims
- 1849US8384881B2Lithographic apparatus, stage apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Feb 26, 2013·0 cites·21 claims
- 1948US7773235B2Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatusASML NETHERLANDS BV·Filed 2008·Granted Aug 10, 2010·1 cites·19 claims
- 2044US10215954B2Focus monitoring arrangement and inspection apparatus including such an arrangementASML NETHERLANDS BV·Filed 2016·Granted Feb 26, 2019·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →