Inventor · disambiguated record
Gian Francesco Lorusso
Also filed as: LORUSSO GIAN F · LORUSSO GIAN FRANCESCO
16 granted patents·3 pending applications·153 citations·filing 2001–2024
93Inventor score
Top patents by PatentIndex Score
19 records- 0188US6930308B1SEM profile and surface reconstruction using multiple data setsKLA TENCOR TECH CORP·Filed 2002·Granted Aug 16, 2005·38 cites·12 claims
- 0286US7361941B1Calibration standards and methodsKLA TENCOR TECH CORP·Filed 2004·Granted Apr 22, 2008·24 cites·29 claims
- 0385US7423269B1Automated feature analysis with off-axis tiltingKLA TENCOR TECH CORP·Filed 2006·Granted Sep 9, 2008·12 cites·13 claims
- 0484US6815675B1Method and system for e-beam scanningKLA TENCOR TECH CORP·Filed 2003·Granted Nov 9, 2004·19 cites·25 claims
- 0577US7750319B2Method and system for measuring contamination of a lithographical elementIMEC·Filed 2007·Granted Jul 6, 2010·6 cites·24 claims
- 0675US7041976B1Automated focusing of electron imageKLA TENCOR TECH CORP·Filed 2003·Granted May 9, 2006·10 cites·10 claims
- 0775US6670612B1Undercut measurement using SEMKLA TENCOR TECH CORP·Filed 2002·Granted Dec 30, 2003·11 cites·20 claims
- 0872US7276690B1Method and system for e-beam scanningKLA TENCOR TECH CORP·Filed 2004·Granted Oct 2, 2007·8 cites·7 claims
- 0968US7015468B1Methods of stabilizing measurement of ArF resist in CD-SEMKLA TENCOR TECH CORP·Filed 2004·Granted Mar 21, 2006·10 cites·20 claims
- 1062US6784425B1Energy filter multiplexingKLA TENCOR TECH CORP·Filed 2001·Granted Aug 31, 2004·7 cites·21 claims
- 1161US7098456B1Method and apparatus for accurate e-beam metrologyKLA TENCOR TECH CORP·Filed 2004·Granted Aug 29, 2006·5 cites·21 claims
- 1260US9104122B2Methods and systems for evaluating extreme ultraviolet mask flatnessLORUSSO GIAN FRANCESCO·Filed 2011·Granted Aug 11, 2015·1 cites·19 claims
- 1360US8006202B2Systems and methods for UV lithographyIMEC·Filed 2008·Granted Aug 23, 2011·1 cites·25 claims
- 1459US9086638B2Detection of contamination in EUV systemsJONCKHEERE RIK·Filed 2011·Granted Jul 21, 2015·1 cites·19 claims
- 1558US12278086B2Pattern height metrology using an e-beam systemIMEC VZW·Filed 2022·Granted Apr 15, 2025·0 cites·20 claims
- 1655US2025052703A1Method for evaluating the bending stiffness of high aspect ratio nanosized structuresIMEC VZW·Filed 2024·Application pending·0 cites
- 1751US2009103069A1Detection of contamination in euv systemsIMEC INTER UNI MICRO ELECTR·Filed 2008·Application pending·0 cites
- 1847US7405402B1Method and apparatus for aberration-insensitive electron beam imagingKLA TENCOR TECH CORP·Filed 2006·Granted Jul 29, 2008·0 cites·20 claims
- 1947US2023298854A1Method of performing metrology on a microfabrication patternIMEC VZW·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →