Inventor · disambiguated record
Gnanamani Amburose
Also filed as: AMBUROSE GNANAMANI
6 granted patents·2 pending applications·10 citations·filing 2017–2024
75Inventor score
Files withLAM RES CORP8
Top patents by PatentIndex Score
8 records- 0192US12272570B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2024·Granted Apr 8, 2025·1 cites·19 claims
- 0291US12272571B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2024·Granted Apr 8, 2025·1 cites·19 claims
- 0391US12211709B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2023·Granted Jan 28, 2025·1 cites·18 claims
- 0491US11694911B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2017·Granted Jul 4, 2023·7 cites·35 claims
- 0581US12347650B2Substrate processing system including dual ion filter for downstream plasmaLAM RES CORP·Filed 2024·Granted Jul 1, 2025·0 cites·17 claims
- 0664US11967486B2Substrate processing system including dual ion filter for downstream plasmaLAM RES CORP·Filed 2020·Granted Apr 23, 2024·0 cites·15 claims
- 0755US2025218819A1Radiative heat windows and wafer support pads in vapor etch reactorsLAM RES CORP·Filed 2023·Application pending·0 cites
- 0853US2025140529A1Etch uniformity improvement in radical etch using confinement ringLAM RES CORP·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →