Inventor · disambiguated record
Gregory Sexton
Also filed as: SEXTON GREGORY · SEXTON GREGORY S
19 granted patents·5 pending applications·818 citations·filing 2007–2025
94Inventor score
Top patents by PatentIndex Score
24 records- 0199US7858898B2Bevel etcher with gap controlLAM RES CORP·Filed 2007·Granted Dec 28, 2010·349 cites·19 claims
- 0297US9881788B2Back side deposition apparatus and applicationsLAM RES CORP·Filed 2014·Granted Jan 30, 2018·372 cites·9 claims
- 0394US7943007B2Configurable bevel etcherLAM RES CORP·Filed 2007·Granted May 17, 2011·24 cites·11 claims
- 0493US8580078B2Bevel etcher with vacuum chuckBAILEY III ANDREW D·Filed 2007·Granted Nov 12, 2013·20 cites·11 claims
- 0591US8721908B2Bevel etcher with vacuum chuckLAM RES CORP·Filed 2013·Granted May 13, 2014·9 cites·13 claims
- 0689US11756771B2Tunable upper plasma-exclusion-zone ring for a bevel etcherLAM RES CORP·Filed 2021·Granted Sep 12, 2023·2 cites·12 claims
- 0789US7938931B2Edge electrodes with variable powerLAM RES CORP·Filed 2007·Granted May 10, 2011·11 cites·12 claims
- 0885US9053925B2Configurable bevel etcherBAILEY III ANDREW D·Filed 2011·Granted Jun 9, 2015·6 cites·13 claims
- 0984US7662254B2Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a waferLAM RES CORP·Filed 2007·Granted Feb 16, 2010·8 cites·12 claims
- 1079US2025364225A1Lower plasma exclusion zone rings for bevel etcherKIM KEECHAN·Filed 2025·Application pending·0 cites
- 1178US9564308B2Methods for processing bevel edge etchingLAM RES CORP·Filed 2015·Granted Feb 7, 2017·2 cites·15 claims
- 1277US7922866B2Apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a waferLAM RES CORP·Filed 2009·Granted Apr 12, 2011·4 cites·12 claims
- 1374US9184043B2Edge electrodes with dielectric coversSEXTON GREGORY S·Filed 2007·Granted Nov 10, 2015·4 cites·11 claims
- 1472US2023402257A1Tunable upper plasma-exclusion-zone ring for a bevel etcherLAM RES CORP·Filed 2023·Application pending·0 cites
- 1568US8562266B2Flush mounted fastener for plasma processing apparatusSEXTON GREGORY·Filed 2011·Granted Oct 22, 2013·4 cites·11 claims
- 1666US8574397B2Bevel edge plasma chamber with top and bottom edge electrodesSEXTON GREGORY S·Filed 2012·Granted Nov 5, 2013·1 cites·20 claims
- 1765US8252140B2Plasma chamber for wafer bevel edge processingSEXTON GREGORY S·Filed 2011·Granted Aug 28, 2012·1 cites·13 claims
- 1863US10937634B2Tunable upper plasma-exclusion-zone ring for a bevel etcherLAM RES CORP·Filed 2013·Granted Mar 2, 2021·1 cites·19 claims
- 1958US12387915B2Lower plasma exclusion zone ring for bevel etcherLAM RES CORP·Filed 2019·Granted Aug 12, 2025·0 cites·58 claims
- 2050US8398875B2Method of orienting an upper electrode relative to a lower electrode for bevel edge processingSEXTON GREGORY S·Filed 2011·Granted Mar 19, 2013·0 cites·13 claims
- 2144US7575638B2Apparatus for defining regions of process exclusion and process performance in a process chamberLAM RES CORP·Filed 2007·Granted Aug 18, 2009·0 cites·20 claims
- 2240US2014007901A1Methods and apparatus for bevel edge cleaning in a plasma processing systemCHEN JACK·Filed 2012·Application pending·0 cites
- 2340US2011206833A1Extension electrode of plasma bevel etching apparatus and method of manufacture thereofLAM RES CORP·Filed 2011·Application pending·0 cites
- 2438US2012318455A1Passive compensation for temperature-dependent wafer gap changes in plasma processing systemsFISCHER ANDREAS·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →