Inventor · disambiguated record
Gregory Michael Wallraff
Also filed as: WALLRAFF GREGORY M · WALLRAFF GREGORY MICHAEL
59 granted patents·3 pending applications·2,238 citations·filing 1989–2021
99Inventor score
Top patents by PatentIndex Score
62 records- 0197US7056840B2Direct photo-patterning of nanoporous organosilicates, and method of useIBM·Filed 2003·Granted Jun 6, 2006·153 cites·26 claims
- 0297US5658734AProcess for synthesizing chemical compoundsIBM·Filed 1995·Granted Aug 19, 1997·306 cites·15 claims
- 0396US8614047B2Photodecomposable bases and photoresist compositionsAYOTHI RAMAKRISHNAN·Filed 2011·Granted Dec 24, 2013·466 cites·29 claims
- 0496US6806026B2Photoresist compositionIBM·Filed 2002·Granted Oct 19, 2004·62 cites·69 claims
- 0596US5665527AProcess for generating negative tone resist images utilizing carbon dioxide critical fluidIBM·Filed 1997·Granted Sep 9, 1997·138 cites·6 claims
- 0695US8703386B2Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applicationsBASS JOHN DAVID·Filed 2012·Granted Apr 22, 2014·39 cites·14 claims
- 0795US6610456B2Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositionsIBM·Filed 2001·Granted Aug 26, 2003·57 cites·56 claims
- 0895US6548219B2Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositionsIBM·Filed 2001·Granted Apr 15, 2003·67 cites·31 claims
- 0994US6509134B2Norbornene fluoroacrylate copolymers and process for the use thereofIBM·Filed 2001·Granted Jan 21, 2003·83 cites·20 claims
- 1092US6653048B2High silicon content monomers and polymers suitable for 193 nm bilayer resistsIBM·Filed 2002·Granted Nov 25, 2003·30 cites·25 claims
- 1192US6444408B1High silicon content monomers and polymers suitable for 193 nm bilayer resistsIBM·Filed 2000·Granted Sep 3, 2002·35 cites·26 claims
- 1291US5985524AProcess for using bilayer photoresistIBM·Filed 1997·Granted Nov 16, 1999·77 cites·37 claims
- 1390US7288362B2Immersion topcoat materials with improved performanceIBM·Filed 2005·Granted Oct 30, 2007·11 cites·25 claims
- 1490US5580694APhotoresist composition with androstane and process for its useIBM·Filed 1994·Granted Dec 3, 1996·68 cites·6 claims
- 1587US9772558B2Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresistsIBM·Filed 2013·Granted Sep 26, 2017·5 cites·27 claims
- 1687US9057960B2Resist performance for the negative tone develop organic development processIBM·Filed 2013·Granted Jun 16, 2015·4 cites·30 claims
- 1787US8821978B2Methods of directed self-assembly and layered structures formed therefromCHENG JOY·Filed 2009·Granted Sep 2, 2014·13 cites·29 claims
- 1887US6962822B2Discrete nano-textured structures in biomolecular arrays, and method of useIBM·Filed 2002·Granted Nov 8, 2005·51 cites·34 claims
- 1986US9450278B2Cathode material for lithium—oxygen batteryIBM·Filed 2012·Granted Sep 20, 2016·5 cites·7 claims
- 2086US6165678ALithographic photoresist composition and process for its use in the manufacture of integrated circuitsIBM·Filed 1998·Granted Dec 26, 2000·59 cites·18 claims
- 2185US7300741B2Advanced chemically amplified resist for sub 30 nm dense feature resolutionIBM·Filed 2006·Granted Nov 27, 2007·7 cites·19 claims
- 2285US5272042APositive photoresist system for near-UV to visible imagingIBM·Filed 1991·Granted Dec 21, 1993·68 cites·3 claims
- 2384US5055439APhotoacid generating composition and sensitizer thereforIBM·Filed 1989·Granted Oct 8, 1991·34 cites·6 claims
- 2483US7767385B2Method for lithography for optimizing process conditionsIBM·Filed 2006·Granted Aug 3, 2010·7 cites·20 claims
- 2582US8900802B2Positive tone organic solvent developed chemically amplified resistIBM·Filed 2013·Granted Dec 2, 2014·3 cites·36 claims
- 2682US7585609B2Bilayer film including an underlayer having vertical acid transport propertiesIBM·Filed 2006·Granted Sep 8, 2009·5 cites·19 claims
- 2782US7135595B2Photoresist compositionIBM·Filed 2006·Granted Nov 14, 2006·4 cites·1 claims
- 2881US9666918B2Lithium oxygen battery and electrolyte compositionIBM·Filed 2014·Granted May 30, 2017·2 cites·7 claims
- 2980US5264325AComposition for photo imagingIBM·Filed 1992·Granted Nov 23, 1993·36 cites·43 claims
- 3080US5071730ALiquid apply, aqueous processable photoresist compositionsIBM·Filed 1991·Granted Dec 10, 1991·50 cites·3 claims
- 3179US5250395AProcess for imaging of photoresist including treatment of the photoresist with an organometallic compoundIBM·Filed 1991·Granted Oct 5, 1993·34 cites·8 claims
- 3278US7651872B2Discrete nano-textured structures in biomolecular arrays, and method of useIBM·Filed 2008·Granted Jan 26, 2010·4 cites·21 claims
- 3376US7014980B2Photoresist compositionIBM·Filed 2004·Granted Mar 21, 2006·10 cites·29 claims
- 3475US7090963B2Process for forming features of 50 nm or less half-pitch with chemically amplified resist imagingIBM·Filed 2003·Granted Aug 15, 2006·16 cites·15 claims
- 3573US7193023B2Low activation energy photoresistsIBM·Filed 2003·Granted Mar 20, 2007·11 cites·56 claims
- 3669US7875408B2Bleachable materials for lithographyIBM·Filed 2007·Granted Jan 25, 2011·3 cites·26 claims
- 3769US6627111B2Organic light emitting displays and new fluorescent compoundsIBM·Filed 2001·Granted Sep 30, 2003·3 cites·4 claims
- 3869US6177228B1Photoresist composition and process for its useIBM·Filed 1997·Granted Jan 23, 2001·35 cites·47 claims
- 3968US7951524B2Self-topcoating photoresist for photolithographyIBM·Filed 2008·Granted May 31, 2011·3 cites·26 claims
- 4067US5786131AProcess for use of photoresist composition with deep ultraviolet radiationIBM·Filed 1996·Granted Jul 28, 1998·28 cites·8 claims
- 4167US5045431ADry film, aqueous processable photoresist compositionsIBM·Filed 1991·Granted Sep 3, 1991·29 cites·4 claims
- 4266US10957953B2Lithium oxygen battery and electrolyte compositionIBM·Filed 2017·Granted Mar 23, 2021·0 cites·18 claims
- 4366USRE38282EProcess for using bilayer photoresistIBM·Filed 2001·Granted Oct 21, 2003·7 cites·81 claims
- 4465US8945808B2Self-topcoating resist for photolithographyDAVID ROBERT ALLEN·Filed 2006·Granted Feb 3, 2015·3 cites·16 claims
- 4564US7807340B2Photoresists for visible light imagingIBM·Filed 2008·Granted Oct 5, 2010·1 cites·25 claims
- 4664US5206117APhotosensitive polyamic alkyl ester composition and process for its useLABADIE JEFFREY W·Filed 1992·Granted Apr 27, 1993·27 cites·3 claims
- 4762US6730452B2Lithographic photoresist composition and process for its useIBM·Filed 2001·Granted May 4, 2004·17 cites·60 claims
- 4861US6180317B1Composition for photoimagingIBM·Filed 1991·Granted Jan 30, 2001·16 cites·24 claims
- 4961US5204226APhotosensitizers for polysilanesIBM·Filed 1991·Granted Apr 20, 1993·17 cites·2 claims
- 5058US7160665B2Method for employing vertical acid transport for lithographic imaging applicationsIBM·Filed 2002·Granted Jan 9, 2007·4 cites·5 claims
Showing the top 50 of 62 patent records by PatentIndex Score.
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