Inventor · disambiguated record
Guan-Jie Shen
Also filed as: SHEN GUAN-JIE
34 granted patents·13 pending applications·46 citations·filing 2002–2025
95Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD44TAIWAN SEMICONDUCTOR MFG2TAIWAN SEMICONDUCTOR MFG CO LID1
Top patents by PatentIndex Score
47 records- 0196US11757023B2Semiconductor device and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 12, 2023·2 cites·20 claims
- 0294US11404274B2Source/drain structure for semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·3 cites·20 claims
- 0392US10141431B1Epitaxy source/drain regions of FinFETs and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 27, 2018·13 cites·20 claims
- 0491US11923439B2Source/drain structure for semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 5, 2024·1 cites·20 claims
- 0591US11862714B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 2, 2024·2 cites·20 claims
- 0691US10276680B2Gate feature in FinFET deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·4 cites·19 claims
- 0789US10665686B2Gate feature in finFET deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 26, 2020·3 cites·20 claims
- 0887US10777664B2Epitaxy source/drain regions of FinFETs and method forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 15, 2020·5 cites·20 claims
- 0984US12288815B2Source/drain structure with enhanced dopant diffusion for semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Apr 29, 2025·0 cites·20 claims
- 1084US2025081496A1Semiconductor device and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1183US11121238B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 14, 2021·3 cites·20 claims
- 1282US12490454B2Method of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 2, 2025·0 cites·20 claims
- 1382US12176421B2Semiconductor device and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 1481US11793003B2Semiconductor structure with embedded memory deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 17, 2023·1 cites·20 claims
- 1581US2023207649A1Novel gate feature in finfet deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1680US2025366123A1Semiconductor devices with modulated gate structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1780US2025234576A1Source/drain structure for semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1879US11232989B2Devices with adjusted fin profile and methods for manufacturing devices with adjusted fin profileTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 25, 2022·2 cites·20 claims
- 1978US12219781B2Semiconductor structure with embedded memory deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 4, 2025·0 cites·20 claims
- 2078US2025120096A1Semiconductor structure with embedded memory deviceTAIWAN SEMICONDUCTOR MFG CO LID·Filed 2024·Application pending·0 cites
- 2177US2025344448A1Multigate Device Structure with Engineered GateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2275US11961911B2Semiconductor devices including channel regions having non-uniform Ge concentrationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 16, 2024·0 cites·21 claims
- 2375US11594607B2Gate feature in FinFET deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 28, 2023·0 cites·20 claims
- 2474US12501640B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 16, 2025·0 cites·20 claims
- 2573US10910479B2Gate feature in FinFET deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 2, 2021·0 cites·20 claims
- 2673US2024387633A1Semiconductor devices having parasitic channel structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2773US2024405075A1Semiconductor devices having counter-doped structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2873US2024379755A1Semiconductor devices with counter-doped nanostructuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2972US2025366048A1Buried gate structures for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3072US2024379877A1Surface-doped channels for threshold voltage modulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3171US12484251B2Multigate device structure with engineered gateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 25, 2025·0 cites·20 claims
- 3270US11538926B2Semiconductor device and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 27, 2022·0 cites·20 claims
- 3369US2022359768A1Surface-Doped Channels for Threshold Voltage ModulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
- 3468US12300718B2Semiconductor devices with counter-doped nanostructuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 13, 2025·0 cites·20 claims
- 3566US12249623B2Semiconductor devices having parasitic channel structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 11, 2025·0 cites·20 claims
- 3663US2022336587A1Semiconductor devices having counter-doped structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
- 3762US12062581B2Devices with adjusted fin profile and methods for manufacturing devices with adjusted fin profileTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 13, 2024·0 cites·20 claims
- 3862US11296227B2Method of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 5, 2022·0 cites·20 claims
- 3958US12464772B2Buried gate structures for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 4057US10115596B2Method of fabricating a semiconductor device having a T-shape in the metal gate line-endTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 30, 2018·0 cites·20 claims
- 4155US9330967B2Method of fabricating a semiconductor device with reduced leak pathsTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted May 3, 2016·0 cites·18 claims
- 4254US9780213B2Semiconductor device having a reversed T-shaped profile in the metal gate line-endTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 3, 2017·0 cites·20 claims
- 4352US9978640B2Method of fabricating a semiconductor device with reduced leak pathsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 22, 2018·0 cites·20 claims
- 4451US11322603B2Anti-punch-through doping on source/drain regionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·0 cites·20 claims
- 4551US6602747B1Method for fabricating bipolar complementary metal oxide semiconductor (BiCMOS) device structureTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Aug 5, 2003·7 cites·14 claims
- 4650US11211479B2Method of fabricating trimmed fin and fin structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 28, 2021·0 cites·20 claims
- 4745US10763280B2Hybrid FinFET structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 1, 2020·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →