Inventor · disambiguated record
Haci Osman Guevenc
Also filed as: GUEVENC HACI OSMAN
13 granted patents·8 pending applications·10 citations·filing 2015–2025
83Inventor score
Files withBASF SE21
Top patents by PatentIndex Score
21 records- 0186US10385236B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 20, 2019·5 cites·14 claims
- 0282US10899945B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substratesBASF SE·Filed 2016·Granted Jan 26, 2021·3 cites·20 claims
- 0375US11264250B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2016·Granted Mar 1, 2022·2 cites·21 claims
- 0473US2025283223A1Compositions and methods for tungsten etching inhibitionBASF SE·Filed 2025·Application pending·0 cites
- 0572US12351737B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Granted Jul 8, 2025·0 cites·12 claims
- 0669US2024002698A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2023·Application pending·0 cites
- 0759US2021102093A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substratesBASF SE·Filed 2020·Application pending·0 cites
- 0857US2022372632A1Compositions and methods for tungsten etching inhibitionBASF SE·Filed 2020·Application pending·0 cites
- 0955US2022049125A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1055US2022064485A1Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Application pending·0 cites
- 1152US2025305152A1Composition, its use and a process for cleaning substrates comprising cobalt and copperBASF SE·Filed 2023·Application pending·0 cites
- 1249US12378439B2Compositions for tungsten etching inhibitionBASF SE·Filed 2020·Granted Aug 5, 2025·0 cites·12 claims
- 1347US10570316B2Chemical mechanical polishing (CMP) compositionBASF SE·Filed 2015·Granted Feb 25, 2020·0 cites·20 claims
- 1446US11725117B2Chemical mechanical polishing of substrates containing copper and rutheniumBASF SE·Filed 2019·Granted Aug 15, 2023·0 cites·17 claims
- 1545US11993729B2Chemical mechanical polishing compositionBASF SE·Filed 2018·Granted May 28, 2024·0 cites·21 claims
- 1641US10865361B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2017·Granted Dec 15, 2020·0 cites·20 claims
- 1741US2023235252A1Use of a Composition Consisting of Ammonia and an Alkanol for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or BelowBASF SE·Filed 2021·Application pending·0 cites
- 1840US11286402B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Mar 29, 2022·0 cites·12 claims
- 1940US10738219B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 11, 2020·0 cites·14 claims
- 2039US10844325B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·13 claims
- 2135US10844333B2Composition for post chemical-mechanical-polishing cleaningBASF SE·Filed 2016·Granted Nov 24, 2020·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →