Inventor · disambiguated record
Hayato Kimura
Also filed as: KIMURA HAYATO
13 granted patents·5 pending applications·32 citations·filing 2001–2025
87Inventor score
Files withNUFLARE TECHNOLOGY INC14KIMURA HAYATO1KIRIN TECHNO SYSTEM CORP1NIPPON CATALYTIC CHEM IND1RENESAS ELECTRONICS CORP1
Top patents by PatentIndex Score
18 records- 0186US10969400B2Semiconductor device, angle value correction circuit and method thereforRENESAS ELECTRONICS CORP·Filed 2018·Granted Apr 6, 2021·3 cites·16 claims
- 0282US7589335B2Charged-particle beam pattern writing method and apparatus and software program for use thereinNUFLARE TECHNOLOGY INC·Filed 2007·Granted Sep 15, 2009·12 cites·14 claims
- 0371US7476881B2Charged beam drawing apparatus and charged beam drawing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jan 13, 2009·3 cites·16 claims
- 0469US7598504B2Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatusNUFLARE TECHNOLOGY INC·Filed 2007·Granted Oct 6, 2009·4 cites·20 claims
- 0568US9934935B2Multi charged particle beam writing apparatus and multi charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2016·Granted Apr 3, 2018·1 cites·10 claims
- 0667US10483087B2Multi charged particle beam writing apparatus and multi charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2017·Granted Nov 19, 2019·1 cites·2 claims
- 0764US9953800B2Multi-charged particle beam writing apparatus and multi-charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2016·Granted Apr 24, 2018·1 cites·13 claims
- 0863US2025323017A1Multiple charged-particle beam writing method and multiple charged-particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2025·Application pending·0 cites
- 0962US2025037960A1Blanking aperture array system, charged particle beam writing apparatus, and method for inspecting blanking aperture array systemNUFLARE TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 1061US7900185B2Pattern writing circuit self-diagnosis method for charged beam photolithography apparatus and charged beam photolithography apparatusNUFLARE TECHNOLOGY INC·Filed 2007·Granted Mar 1, 2011·1 cites·20 claims
- 1161US2025249423A1Handling device for easily polymerizable substanceNIPPON CATALYTIC CHEM IND·Filed 2023·Application pending·0 cites
- 1260US2024282550A1Blanking aperture array system and charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 1359US2024013999A1Mounting substrate, blanking aperture array chip, blanking aperture array system and multi charged particle beam irradiation apparatusNUFLARE TECHNOLOGY INC·Filed 2023·Application pending·0 cites
- 1455US8892971B2Output control scan flip-flop, semiconductor integrated circuit including the same, and design method for semiconductor integrated circuitKIMURA HAYATO·Filed 2012·Granted Nov 18, 2014·1 cites·15 claims
- 1550US10475621B2Drawing device and drawing methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Nov 12, 2019·0 cites·12 claims
- 1646US10886103B2Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Jan 5, 2021·0 cites·19 claims
- 1742US10109454B2Diagnosis method, charged particle beam lithography apparatus, and recording mediumNUFLARE TECHNOLOGY INC·Filed 2017·Granted Oct 23, 2018·0 cites·20 claims
- 1840US7057157B2Photosensor device and disk inspection apparatus using itKIRIN TECHNO SYSTEM CORP·Filed 2001·Granted Jun 6, 2006·5 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →