Inventor · disambiguated record
Hans-Juergen Mann
Also filed as: MANN HANS-JUERGEN
119 granted patents·27 pending applications·681 citations·filing 2002–2018
99Inventor score
Top patents by PatentIndex Score
146 records- 0198US7414781B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2006·Granted Aug 19, 2008·64 cites·50 claims
- 0297US8004755B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT GMBH·Filed 2010·Granted Aug 23, 2011·12 cites·17 claims
- 0397US7199922B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2005·Granted Apr 3, 2007·26 cites·6 claims
- 0496US9366968B2Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methodsZEISS CARL SMT GMBH·Filed 2013·Granted Jun 14, 2016·20 cites·25 claims
- 0596US7085075B2Projection objectives including a plurality of mirrors with lenses ahead of mirror M3ZEISS CARL SMT AG·Filed 2003·Granted Aug 1, 2006·82 cites·52 claims
- 0695US6927901B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2002·Granted Aug 9, 2005·54 cites·18 claims
- 0794US8810903B2Imaging optical systemMANN HANS-JUERGEN·Filed 2012·Granted Aug 19, 2014·6 cites·36 claims
- 0894US7977651B2Illumination system particularly for microlithographyZEISS CARL SMT GMBH·Filed 2009·Granted Jul 12, 2011·15 cites·20 claims
- 0994US7385756B2Catadioptric projection objectiveZEISS CARL SMT AG·Filed 2005·Granted Jun 10, 2008·42 cites·109 claims
- 1093US8279404B2Projection objective having mirror elements with reflective coatingsCHAN DANNY·Filed 2010·Granted Oct 2, 2012·12 cites·19 claims
- 1193US7982854B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemZEISS CARL SMT GMBH·Filed 2006·Granted Jul 19, 2011·15 cites·12 claims
- 1293US7463422B2Projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·19 cites·23 claims
- 1391US8817233B2Illumination optical system for projection lithographyMANN HANS-JUERGEN·Filed 2011·Granted Aug 26, 2014·7 cites·25 claims
- 1491US8208199B2Catadioptric projection objectiveSHAFER DAVID·Filed 2009·Granted Jun 26, 2012·7 cites·20 claims
- 1590US8208198B2Catadioptric projection objectiveSHAFER DAVID·Filed 2007·Granted Jun 26, 2012·8 cites·4 claims
- 1690US8027022B2Projection objectiveZEISS CARL SMT GMBH·Filed 2008·Granted Sep 27, 2011·12 cites·21 claims
- 1790US8018650B2Imaging optical systemZEISS CARL SMT GMBH·Filed 2008·Granted Sep 13, 2011·14 cites·36 claims
- 1890US7712905B2Imaging system with mirror groupZEISS CARL SMT AG·Filed 2005·Granted May 11, 2010·9 cites·31 claims
- 1989US8967817B2Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscuredZEISS CARL SMT GMBH·Filed 2013·Granted Mar 3, 2015·3 cites·31 claims
- 2089US8169694B2Catoptric objectives and systems using catoptric objectivesMANN HANS-JUERGEN·Filed 2009·Granted May 1, 2012·7 cites·29 claims
- 2188US8194230B2Projection objectives having mirror elements with reflective coatingsCHAN DANNY·Filed 2007·Granted Jun 5, 2012·11 cites·48 claims
- 2288US6859328B2Illumination system particularly for microlithographyCARL ZEISS SEMICONDUCTOR·Filed 2002·Granted Feb 22, 2005·58 cites·24 claims
- 2387US9568832B2Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methodsZEISS CARL SMT GMBH·Filed 2016·Granted Feb 14, 2017·2 cites·21 claims
- 2487US8317345B2Catoptric objectives and systems using catoptric objectivesMANN HANS-JUERGEN·Filed 2011·Granted Nov 27, 2012·5 cites·14 claims
- 2587US7477355B2Projection exposure apparatus and projection optical systemZEISS CARL SMT AG·Filed 2005·Granted Jan 13, 2009·10 cites·15 claims
- 2686US8873122B2Microlithographic imaging optical system including multiple mirrorsMANN HANS-JUERGEN·Filed 2011·Granted Oct 28, 2014·4 cites·23 claims
- 2786US7450301B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2007·Granted Nov 11, 2008·8 cites·17 claims
- 2885US8629972B2Projection objective for microlithographyZELLNER JOHANNES·Filed 2010·Granted Jan 14, 2014·6 cites·37 claims
- 2985US7348565B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Mar 25, 2008·10 cites·27 claims
- 3084US9772478B2Catadioptric projection objective with parallel, offset optical axesZEISS CARL SMT GMBH·Filed 2015·Granted Sep 26, 2017·2 cites·16 claims
- 3184US7186983B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·21 cites·21 claims
- 3283US7869138B2Projection objective and projection exposure apparatus with negative back focus of the entry pupilZEISS CARL SMT AG·Filed 2007·Granted Jan 11, 2011·7 cites·45 claims
- 3383US7372624B28-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2006·Granted May 13, 2008·5 cites·14 claims
- 3482US8632195B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT GMBH·Filed 2012·Granted Jan 21, 2014·3 cites·25 claims
- 3582US8243364B2Reflective optical element and EUV lithography applianceTRENKLER JOHANN·Filed 2011·Granted Aug 14, 2012·4 cites·26 claims
- 3682US8094380B2Projection objective and projection exposure apparatus with negative back focus of the entry pupilMANN HANS-JUERGEN·Filed 2010·Granted Jan 10, 2012·5 cites·25 claims
- 3782US7869122B2Catadioptric projection objectiveZEISS CARL SMT AG·Filed 2008·Granted Jan 11, 2011·5 cites·2 claims
- 3881US8891163B2Reflective optical element and EUV lithography applianceZEISS CARL SMT GMBH·Filed 2013·Granted Nov 18, 2014·2 cites·10 claims
- 3981US8576376B2Imaging optical system and projection exposure system for microlithographyMANN HANS-JUERGEN·Filed 2010·Granted Nov 5, 2013·4 cites·26 claims
- 4080US9500958B2Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this typeZEISS CARL SMT GMBH·Filed 2013·Granted Nov 22, 2016·3 cites·22 claims
- 4179US8289619B2Catadioptric projection objectiveSHAFER DAVID·Filed 2011·Granted Oct 16, 2012·2 cites·27 claims
- 4279US8208200B2Imaging optical systemMANN HANS-JUERGEN·Filed 2011·Granted Jun 26, 2012·3 cites·20 claims
- 4379US7929114B2Projection optics for microlithographyZEISS CARL SMT GMBH·Filed 2008·Granted Apr 19, 2011·6 cites·23 claims
- 4478US8643824B2Projection optics for microlithographyMANN HANS-JUERGEN·Filed 2011·Granted Feb 4, 2014·3 cites·23 claims
- 4578US8610877B2Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this typeMANN HANS-JUERGEN·Filed 2011·Granted Dec 17, 2013·3 cites·20 claims
- 4678US7522260B1Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned componentsZEISS CARL SMT AG·Filed 2005·Granted Apr 21, 2009·5 cites·25 claims
- 4778US7456408B2Illumination system particularly for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 25, 2008·6 cites·14 claims
- 4877US7999913B2Microlithography projection system with an accessible diaphragm or aperture stopZEISS CARL SMT GMBH·Filed 2007·Granted Aug 16, 2011·3 cites·3 claims
- 4975US10007187B2Imaging optical systemZEISS CARL SMT GMBH·Filed 2017·Granted Jun 26, 2018·1 cites·20 claims
- 5074US9720329B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Aug 1, 2017·1 cites·19 claims
Showing the top 50 of 146 patent records by PatentIndex Score.
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