Inventor · disambiguated record
Hanh Nguyen
Also filed as: NGUYEN HANH · NGUYEN HANH D
17 granted patents·8 pending applications·278 citations·filing 1998–2024
93Inventor score
Top patents by PatentIndex Score
25 records- 0196US8894767B2Flow control features of CVD chambersCHUC KIEN N·Filed 2010·Granted Nov 25, 2014·107 cites·16 claims
- 0295US8137463B2Dual zone gas injection nozzleLIU WEI·Filed 2007·Granted Mar 20, 2012·36 cites·8 claims
- 0394US8999106B2Apparatus and method for controlling edge performance in an inductively coupled plasma chamberLIU WEI·Filed 2007·Granted Apr 7, 2015·43 cites·17 claims
- 0490US9416450B2Showerhead designs of a hot wire chemical vapor deposition (HWCVD) chamberAPPLIED MATERIALS INC·Filed 2013·Granted Aug 16, 2016·7 cites·20 claims
- 0586US11081317B2Modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·3 cites·19 claims
- 0686US10550472B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2014·Granted Feb 4, 2020·2 cites·4 claims
- 0785US10943768B2Modular high-frequency source with integrated gas distributionAPPLIED MATERIALS INC·Filed 2018·Granted Mar 9, 2021·3 cites·9 claims
- 0883US11393661B2Remote modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2018·Granted Jul 19, 2022·3 cites·15 claims
- 0981US2024282554A1Modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1078US6110322APrevention of ground fault interrupts in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Aug 29, 2000·65 cites·20 claims
- 1174US12002654B2Modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2021·Granted Jun 4, 2024·0 cites·15 claims
- 1274US8062472B2Method of correcting baseline skew by a novel motorized source coil assemblyLIU WEI·Filed 2007·Granted Nov 22, 2011·3 cites·19 claims
- 1370US12146219B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 19, 2024·0 cites·21 claims
- 1469US11501955B2Modular high-frequency source with integrated gas distributionAPPLIED MATERIALS INC·Filed 2021·Granted Nov 15, 2022·0 cites·10 claims
- 1568US10269593B2Apparatus for coupling a hot wire source to a process chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 23, 2019·3 cites·19 claims
- 1664US9206512B2Gas distribution systemNGUYEN HANH D·Filed 2012·Granted Dec 8, 2015·3 cites·14 claims
- 1755US11488796B2Thermal break for high-frequency antennaeAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·0 cites·9 claims
- 1852US12300497B2Method and apparatus of low temperature plasma enhanced chemical vapor deposition of grapheneAPPLIED MATERIALS INC·Filed 2021·Granted May 13, 2025·0 cites·15 claims
- 1952US2012164845A1Dual zone gas injection nozzleLIU WEI·Filed 2012·Application pending·0 cites
- 2049US2009162570A1Apparatus and method for processing a substrate using inductively coupled plasma technologyAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2147US2013160794A1Methods and apparatus for cleaning substrate surfaces with atomic hydrogenAPPLIED MATERIALS INC·Filed 2012·Application pending·0 cites
- 2247US2021391156A1Clean unit for chamber exhaust cleaningAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2345US2006021703A1Dual gas faceplate for a showerhead in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2443US2015311061A1Methods and apparatus for cleaning substrate surfaces with atomic hydrogenAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 2539US2003017268A1.method of cvd titanium nitride film deposition for increased titanium nitride film uniformityAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →