Inventor · disambiguated record
Hans-Juergen Rostalski
Also filed as: ROSTALSKI HANS-JUERGEN
35 granted patents·4 pending applications·742 citations·filing 2003–2021
97Inventor score
Files withZEISS CARL SMT AG20ZEISS CARL SMT GMBH13ROSTALSKI HANS-JUERGEN3FELDMANN HEIKO1MANN HANS-JUERGEN1
Top patents by PatentIndex Score
39 records- 0199US7312847B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2005·Granted Dec 25, 2007·84 cites·47 claims
- 0299US6891596B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2003·Granted May 10, 2005·174 cites·113 claims
- 0398US10527832B2Imaging optical unit and projection exposure apparatus including sameZEISS CARL SMT GMBH·Filed 2017·Granted Jan 7, 2020·23 cites·20 claims
- 0498US7382540B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Jun 3, 2008·105 cites·3 claims
- 0598US7190527B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Mar 13, 2007·161 cites·57 claims
- 0695US7187503B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·68 cites·48 claims
- 0794US11650510B2Projection optical unit for microlithography and method for producing a structured componentZEISS CARL SMT GMBH·Filed 2021·Granted May 16, 2023·2 cites·20 claims
- 0893US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 0991US6906866B2Compact 1½-waist system for sub 100 nm ArF lithographyZEISS CARL SMT AG·Filed 2003·Granted Jun 14, 2005·39 cites·31 claims
- 1090US8345350B2Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2009·Granted Jan 1, 2013·20 cites·42 claims
- 1186US7532306B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted May 12, 2009·17 cites·10 claims
- 1279US11119413B2Imaging optical unit for imaging an object field into an image fieldZEISS CARL SMT GMBH·Filed 2020·Granted Sep 14, 2021·1 cites·19 claims
- 1377US7277231B2Projection objective of a microlithographic exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Oct 2, 2007·8 cites·24 claims
- 1474US10254653B2Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unitZEISS CARL SMT GMBH·Filed 2018·Granted Apr 9, 2019·1 cites·21 claims
- 1573US8605257B2Projection system with compensation of intensity variations and compensation element thereforPAZIDIS ALEXANDRA·Filed 2005·Granted Dec 10, 2013·7 cites·45 claims
- 1670US7408716B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2007·Granted Aug 5, 2008·2 cites·17 claims
- 1765US7551361B2Lithography lens system and projection exposure system provided with at least one lithography lens system of this typeZEISS CARL SMT AG·Filed 2004·Granted Jun 23, 2009·7 cites·24 claims
- 1862US7835073B2Projection objective for lithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 16, 2010·2 cites·21 claims
- 1962US7738188B2Projection objective and projection exposure apparatus including the sameZEISS CARL SMT AG·Filed 2007·Granted Jun 15, 2010·2 cites·50 claims
- 2060US9057964B2Imaging optics and projection exposure installation for microlithography with an imaging opticsMANN HANS-JUERGEN·Filed 2011·Granted Jun 16, 2015·1 cites·20 claims
- 2160US2010045952A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 2258US7751129B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2003·Granted Jul 6, 2010·4 cites·53 claims
- 2358US2008316452A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2458US2016131980A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 2556US10139734B2Imaging optical unit and projection exposure apparatus for projection lithography, having such imaging optical unitZEISS CARL SMT GMBH·Filed 2014·Granted Nov 27, 2018·0 cites·22 claims
- 2655US10101668B2Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2012·Granted Oct 16, 2018·0 cites·13 claims
- 2751US9291751B2Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unitZEISS CARL SMT GMBH·Filed 2013·Granted Mar 22, 2016·0 cites·20 claims
- 2851US7969663B2Projection objective for immersion lithographyZEISS CARL SMT GMBH·Filed 2010·Granted Jun 28, 2011·0 cites·56 claims
- 2951US7965453B2Projection objective and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2010·Granted Jun 21, 2011·0 cites·22 claims
- 3050US8451458B2Imaging microoptics for measuring the position of an aerial imageROSTALSKI HANS-JUERGEN·Filed 2012·Granted May 28, 2013·0 cites·21 claims
- 3150US8068276B2Projection objective for lithographyFELDMANN HEIKO·Filed 2010·Granted Nov 29, 2011·0 cites·20 claims
- 3249US9709494B2Measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Jul 18, 2017·0 cites·21 claims
- 3349US2010085644A1Projection objective and projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 3448US8164759B2Imaging microoptics for measuring the position of an aerial imageROSTALSKI HANS-JUERGEN·Filed 2010·Granted Apr 24, 2012·0 cites·20 claims
- 3547US7834981B2Projection exposure apparatus, projection exposure method and projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Nov 16, 2010·0 cites·52 claims
- 3647US7411201B2Projection objective for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Aug 12, 2008·0 cites·33 claims
- 3744US10330903B2Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unitZEISS CARL SMT GMBH·Filed 2018·Granted Jun 25, 2019·0 cites·20 claims
- 3844US9086561B2Optical arrangement in a projection objective of a microlithographic projection exposure apparatusROSTALSKI HANS-JUERGEN·Filed 2011·Granted Jul 21, 2015·0 cites·17 claims
- 3940US7492509B2Projection optical systemZEISS CARL SMT AG·Filed 2004·Granted Feb 17, 2009·0 cites·54 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →