Inventor · disambiguated record
Haiqing Wei
Also filed as: WEI HAIQING
24 granted patents·9 pending applications·438 citations·filing 2000–2024
96Inventor score
Files withWUHAN YUWEI OPTICAL SOFTWARE CO LTD10WEI HAIQING8OLAMBDA INC7GAZILLION BITS INC5SYNOPSYS INC2
Top patents by PatentIndex Score
33 records- 0197US7941768B1Photolithographic process simulation in integrated circuit design and manufacturingOLAMBDA INC·Filed 2007·Granted May 10, 2011·57 cites·100 claims
- 0297US7921383B1Photolithographic process simulation including efficient result computation for multiple process variation valuesOLAMBDA INC·Filed 2007·Granted Apr 5, 2011·134 cites·6 claims
- 0395US7788628B1Computational efficiency in photolithographic process simulationOLAMBDA INC·Filed 2008·Granted Aug 31, 2010·26 cites·7 claims
- 0494US8165854B1Computer simulation of photolithographic processingWEI HAIQING·Filed 2008·Granted Apr 24, 2012·22 cites·46 claims
- 0594US7921387B2Computational efficiency in photolithographic process simulationOLAMBDA INC·Filed 2010·Granted Apr 5, 2011·9 cites·6 claims
- 0694US7068948B2Generation of optical signals with return-to-zero formatGAZILLION BITS INC·Filed 2001·Granted Jun 27, 2006·74 cites·49 claims
- 0793US8532964B2Computer simulation of photolithographic processingWEI HAIQING·Filed 2012·Granted Sep 10, 2013·9 cites·30 claims
- 0890US6836357B2Semiconductor optical amplifier using laser cavity energy to amplify signal and method of fabrication thereofGAZILLION BITS INC·Filed 2001·Granted Dec 28, 2004·33 cites·50 claims
- 0985US7191428B2Centerline-based pinch/bridge detectionSYNOPSYS INC·Filed 2005·Granted Mar 13, 2007·10 cites·17 claims
- 1083US8907456B2Multi-material hard mask or prepatterned layer for use with multi-patterning photolithographyWEI HAIQING·Filed 2008·Granted Dec 9, 2014·9 cites·38 claims
- 1183US8484587B2Computational efficiency in photolithographic process simulationWEI HAIQING·Filed 2011·Granted Jul 9, 2013·3 cites·16 claims
- 1278US12112409B2Method and system for pixelating vector graphic into imageWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2022·Granted Oct 8, 2024·1 cites·10 claims
- 1376US6944361B2Electrically controllable integrated optical cross-connectGAZILLION BITS INC·Filed 2002·Granted Sep 13, 2005·18 cites·27 claims
- 1475US8417080B2Nonlinearity compensation in a fiber optic communications systemWEI HAIQING·Filed 2011·Granted Apr 9, 2013·3 cites·22 claims
- 1573US8838016B2Computer-aided learning system and method with adaptive optimizationWEI HAIQING·Filed 2010·Granted Sep 16, 2014·3 cites·6 claims
- 1673US6396586B1Reducing nonlinearities caused by transmission of optical information through nonlinear mediaGAZILLION BITS INC·Filed 2000·Granted May 28, 2002·15 cites·70 claims
- 1772US7869680B2Nonlinearity compensation in a fiber optic communications systemOLAMBDA INC·Filed 2005·Granted Jan 11, 2011·4 cites·18 claims
- 1869US7978945B2Nonlinearity compensation in a fiber optic communications systemOLAMBDA INC·Filed 2011·Granted Jul 12, 2011·2 cites·16 claims
- 1965US7265898B2Semiconductor optical amplifier using laser cavity energy to amplify signal and method of fabrication thereofGAZILLION BITS INC·Filed 2004·Granted Sep 4, 2007·6 cites·15 claims
- 2065US2025328083A1Simulation method for programmable illumination system and source mask optimization methodWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2024·Application pending·0 cites
- 2164US2025180980A1Method, system and electronic apparatus for mask feature optimizationWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2024·Application pending·0 cites
- 2260US11687697B2Method and system for correcting lithography process hotspots based on stress damping adjustmentWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2021·Granted Jun 27, 2023·0 cites·10 claims
- 2358US2013290915A1Computational efficiency in photolithographic process simulationOLAMBDA INC·Filed 2013·Application pending·0 cites
- 2457US12050407B2Light source calibration method and system employed in source mask optimizationWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2022·Granted Jul 30, 2024·0 cites·11 claims
- 2555US2025181792A1Modeling, calibration method and device for nonlinear system in computational lithographyWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2024·Application pending·0 cites
- 2655US2023016119A1Monte Carlo Quantum ComputingWEI HAIQING·Filed 2021·Application pending·0 cites
- 2753US2023325556A1Solution to the Sign Problem Using a Sum of Controlled Few-FermionsWEI HAIQING·Filed 2023·Application pending·0 cites
- 2849US2025217541A1Optimization method and system based on low-rank regression of historical iteration dataWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2024·Application pending·0 cites
- 2948US12306543B2Optical imaging method, device and system for photolithography systemWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2022·Granted May 20, 2025·0 cites·10 claims
- 3047US12339581B2Photolithographic mask optimization method and system without border defectsWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2022·Granted Jun 24, 2025·0 cites·10 claims
- 3146US2022276564A1Method and apparatus for photolithographic imagingASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 3243US10386718B2Method for modeling a photoresist profileSYNOPSYS INC·Filed 2015·Granted Aug 20, 2019·0 cites·24 claims
- 3343US2024046006A1Method and system for modeling, calibration, and simulation of multi-stage series photoresist characterization networkWUHAN YUWEI OPTICAL SOFTWARE CO LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →