Inventor · disambiguated record
Helmut Beierl
Also filed as: BEIERL HELMUT
24 granted patents·2 pending applications·557 citations·filing 1999–2013
96Inventor score
Files withZEISS CARL SMT AG11ZEISS STIFTUNG5ZEISS CARL SEMICONDUCTOR MFG3BEIERL HELMUT2TOTZECK MICHAEL2
Top patents by PatentIndex Score
26 records- 0195US7426082B2Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2005·Granted Sep 16, 2008·20 cites·22 claims
- 0295US7187503B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·68 cites·48 claims
- 0395US6665126B2Projection exposure lens with aspheric elementsZEISS STIFTUNG·Filed 2000·Granted Dec 16, 2003·66 cites·78 claims
- 0493US6995930B2Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2003·Granted Feb 7, 2006·39 cites·52 claims
- 0593US6646718B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Nov 11, 2003·49 cites·11 claims
- 0690US6349005B1Microlithographic reduction objective, projection exposure equipment and processZEISS STIFTUNG·Filed 1999·Granted Feb 19, 2002·74 cites·29 claims
- 0789US6496306B1Catadioptric optical system and exposure apparatus having the sameZEISS STIFTUNG·Filed 1999·Granted Dec 17, 2002·64 cites·20 claims
- 0889US6424471B1Catadioptric objective with physical beam splitterZEISS STIFTUNG·Filed 2000·Granted Jul 23, 2002·40 cites·50 claims
- 0988US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 1087US6717746B2Catadioptric reduction lensZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Apr 6, 2004·30 cites·24 claims
- 1185US7006304B2Catadioptric reduction lensZEISS CARL SMT AG·Filed 2004·Granted Feb 28, 2006·24 cites·41 claims
- 1285US6806942B2Projection exposure systemZEISS CARL SMT AG·Filed 2003·Granted Oct 19, 2004·32 cites·39 claims
- 1382US7136220B2Catadioptric reduction lensZEISS CARL SMT AG·Filed 2004·Granted Nov 14, 2006·19 cites·54 claims
- 1479US9146475B2Projection exposure system and projection exposure methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 29, 2015·3 cites·33 claims
- 1576US6717722B2Catadioptric optical system and exposure apparatus having the sameZEISS CAR·Filed 2002·Granted Apr 6, 2004·12 cites·33 claims
- 1670US7408716B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2007·Granted Aug 5, 2008·2 cites·17 claims
- 1765US8319944B2Projection lens system of a microlithographic projection exposure installationBEIERL HELMUT·Filed 2010·Granted Nov 27, 2012·1 cites·20 claims
- 1860US6985286B2Catadioptric optical system and exposure apparatus having the sameZEISS CARL SMT AG·Filed 2004·Granted Jan 10, 2006·4 cites·36 claims
- 1958US9164396B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT GMBH·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 2055US8107054B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2008·Granted Jan 31, 2012·0 cites·24 claims
- 2154US8982325B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2011·Granted Mar 17, 2015·0 cites·24 claims
- 2253US6903802B2Projection objective having adjacently mounted aspheric lens surfacesZEISS STIFTUNG·Filed 2003·Granted Jun 7, 2005·2 cites·32 claims
- 2351US2008316456A1Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2447US7154678B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2005·Granted Dec 26, 2006·0 cites·19 claims
- 2542US2005185269A1Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 2639US8436982B2Projection objective for microlithographyBEIERL HELMUT·Filed 2010·Granted May 7, 2013·0 cites·23 claims
Join the waitlist — get patent alerts
Get an alert when Helmut Beierl files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →