Inventor · disambiguated record
Hermanus Adrianus Dillen
Also filed as: DILLEN HERMANUS ADRIANUS
11 granted patents·10 pending applications·4 citations·filing 2016–2025
81Inventor score
Files withASML NETHERLANDS BV21
Top patents by PatentIndex Score
21 records- 0185US2025355366A1Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0278US11860548B2Method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2020·Granted Jan 2, 2024·1 cites·21 claims
- 0378US10754256B2Method and apparatus for pattern correction and verificationASML NETHERLANDS BV·Filed 2016·Granted Aug 25, 2020·2 cites·21 claims
- 0476US2024111218A1A method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0572US11646174B2Method for calibrating a scanning charged particle microscopeASML NETHERLANDS BV·Filed 2019·Granted May 9, 2023·1 cites·11 claims
- 0671US11972922B2Method for calibrating a scanning charged particle microscopeASML NETHERLANDS BV·Filed 2023·Granted Apr 30, 2024·0 cites·11 claims
- 0767US12386268B2Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2021·Granted Aug 12, 2025·0 cites·20 claims
- 0865US12124179B2Method of wafer alignment using at resolution metrology on product featuresASML NETHERLANDS BV·Filed 2021·Granted Oct 22, 2024·0 cites·20 claims
- 0963US11733614B2Method of metrology and associated apparatusesASML NETHERLANDS BV·Filed 2021·Granted Aug 22, 2023·0 cites·18 claims
- 1058US11796920B2Method for controlling a manufacturing process and associated apparatusesASML NETHERLANDS BV·Filed 2021·Granted Oct 24, 2023·0 cites·20 claims
- 1158US11112703B2Method of metrology and associated apparatusesASML NETHERLANDS BV·Filed 2019·Granted Sep 7, 2021·0 cites·19 claims
- 1255US2024297013A1Aligning a distorted imageASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1355US2023333485A1Target structure and associated methods and apparatusASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1452US2025336046A1System and method for distortion adjustment during inspectionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1551US12315175B2Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the methodASML NETHERLANDS BV·Filed 2019·Granted May 27, 2025·0 cites·20 claims
- 1651US11668661B2Inspection tool and inspection methodASML NETHERLANDS BV·Filed 2020·Granted Jun 6, 2023·0 cites·10 claims
- 1751US2024021404A1Charged-particle beam apparatus with beam-tilt and methods thereofASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1851US2024319123A1System and method for inspection by failure mechanism classification and identification in a charged particle systemASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1949US2022050391A1Methods and apparatus for estimating substrate shapeASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 2049US2024004309A1A method of monitoring a lithographic processASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2146US2024346200A1A method of monitoring a lithographic process and associated apparatusesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →