Inventor · disambiguated record
Heiko Feldmann
Also filed as: FELDMANN HEIKO
58 granted patents·20 pending applications·135 citations·filing 2004–2025
98Inventor score
Top patents by PatentIndex Score
78 records- 0196US11194256B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 7, 2021·5 cites·20 claims
- 0294US9651872B2Projection lens with wavefront manipulatorZEISS CARL SMT GMBH·Filed 2015·Granted May 16, 2017·6 cites·17 claims
- 0390US8345350B2Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2009·Granted Jan 1, 2013·20 cites·42 claims
- 0489US10928332B2Inspection device for masks for semiconductor lithography and methodZEISS CARL SMT GMBH·Filed 2018·Granted Feb 23, 2021·3 cites·28 claims
- 0588US7782440B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Aug 24, 2010·8 cites·4 claims
- 0687US10852640B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 1, 2020·2 cites·31 claims
- 0787US7800732B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2009·Granted Sep 21, 2010·9 cites·21 claims
- 0886US11947265B2Optical diffraction componentZEISS CARL SMT GMBH·Filed 2022·Granted Apr 2, 2024·1 cites·20 claims
- 0986US8310752B2Method of manufacturing a projection objective and projection objectiveFELDMANN HEIKO·Filed 2009·Granted Nov 13, 2012·7 cites·5 claims
- 1086US7728975B1Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Jun 1, 2010·8 cites·27 claims
- 1184US7589903B2Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production methodZEISS CARL SMT AG·Filed 2006·Granted Sep 15, 2009·7 cites·51 claims
- 1281US8674329B2Method and apparatus for analyzing and/or repairing of an EUV mask defectBUDACH MICHAEL·Filed 2011·Granted Mar 18, 2014·4 cites·10 claims
- 1380US11817231B2Detection system for X-ray inspection of an objectZEISS CARL SMT GMBH·Filed 2021·Granted Nov 14, 2023·1 cites·26 claims
- 1479US7848031B2Hologram and method of manufacturing an optical element using a hologramZEISS CARL SMT AG·Filed 2006·Granted Dec 7, 2010·11 cites·8 claims
- 1578US2024152057A1Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1676US7777963B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT AG·Filed 2006·Granted Aug 17, 2010·3 cites·53 claims
- 1775US9097984B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Aug 4, 2015·1 cites·30 claims
- 1873US8605257B2Projection system with compensation of intensity variations and compensation element thereforPAZIDIS ALEXANDRA·Filed 2005·Granted Dec 10, 2013·7 cites·45 claims
- 1971US9658533B2Arrangement of a mirrorZEISS CARL SMT GMBH·Filed 2014·Granted May 23, 2017·2 cites·19 claims
- 2071US9568394B2Optical deviceZEISS CARL SMT GMBH·Filed 2013·Granted Feb 14, 2017·1 cites·13 claims
- 2170US11914303B2Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2021·Granted Feb 27, 2024·0 cites·17 claims
- 2270US2025116939A1Method for operating a microlithographic projection exposure apparatus, microlithographic mask and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2369US11867642B2Inspection device for masks for semiconductor lithography and methodZEISS CARL SMT GMBH·Filed 2021·Granted Jan 9, 2024·0 cites·24 claims
- 2468US9069263B2Method for improving the imaging properties of a projection objective, and such a projection objectiveCONRADI OLAF·Filed 2010·Granted Jun 30, 2015·1 cites·28 claims
- 2567US12040103B2Imaging optical arrangement to image an object illuminated by X-raysZEISS CARL SMT GMBH·Filed 2021·Granted Jul 16, 2024·0 cites·18 claims
- 2667US9298102B2Projection lens with wavefront manipulatorZEISS CARL SMT GMBH·Filed 2014·Granted Mar 29, 2016·1 cites·20 claims
- 2767US8294991B2Interference systems for microlithgraphic projection exposure systemsMUELLER RALF·Filed 2010·Granted Oct 23, 2012·2 cites·24 claims
- 2866US2024295507A1Imaging optical arrangement to image an object illuminated by x-raysZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2965US8319944B2Projection lens system of a microlithographic projection exposure installationBEIERL HELMUT·Filed 2010·Granted Nov 27, 2012·1 cites·20 claims
- 3065US2023367227A1Optical system, lithography apparatus and methodZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3164US8031326B2Illumination system or projection lens of a microlithographic exposure systemZEISS CARL SMT GMBH·Filed 2008·Granted Oct 4, 2011·3 cites·35 claims
- 3262US10114293B2Illumination system and projection objective of a mask inspection apparatusFELDMANN HEIKO·Filed 2012·Granted Oct 30, 2018·1 cites·45 claims
- 3362US7835073B2Projection objective for lithographyZEISS CARL SMT AG·Filed 2008·Granted Nov 16, 2010·2 cites·21 claims
- 3462US7738188B2Projection objective and projection exposure apparatus including the sameZEISS CARL SMT AG·Filed 2007·Granted Jun 15, 2010·2 cites·50 claims
- 3561US10281824B2Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted May 7, 2019·0 cites·24 claims
- 3660US2014293256A1Microlithography projection objectiveZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 3759US7697211B2Symmetrical objective having four lens groups for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Apr 13, 2010·2 cites·26 claims
- 3858US9164396B2Projection lens system of a microlithographic projection exposure installationZEISS CARL SMT GMBH·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 3958US9158205B2Optical arrangement for three-dimensionally patterning a material layerZEISS CARL SMT GMBH·Filed 2014·Granted Oct 13, 2015·0 cites·20 claims
- 4058US7286284B2Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionZEISS CARL SMS GMBH·Filed 2004·Granted Oct 23, 2007·13 cites·34 claims
- 4158US2025135716A1Method for producing a main body of an optical element for semiconductor lithography, main body, optical element and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 4257USRE44216EMicroscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionTOTZECK MICHAEL·Filed 2009·Granted May 14, 2013·0 cites·35 claims
- 4357US7982969B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Jul 19, 2011·1 cites·47 claims
- 4457US2010112465A1Optical arrangement for three-dimensionally patterning a material layerZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4556US9581813B2Method for improving the imaging properties of a projection objective, and such a projection objectiveZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·35 claims
- 4655US10101668B2Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the sameZEISS CARL SMT GMBH·Filed 2012·Granted Oct 16, 2018·0 cites·13 claims
- 4755US8107054B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2008·Granted Jan 31, 2012·0 cites·24 claims
- 4855US2017322343A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 4955US2014320955A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 5054US8982325B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2011·Granted Mar 17, 2015·0 cites·24 claims
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →