Inventor · disambiguated record
Heinz Holzwarth
Also filed as: HOLZWARTH HEINZ
6 granted patents·145 citations·filing 1994–1997
85Inventor score
Files withOLIN MICROELECTRONIC CHEM INC2CIBA GEIGY CORP1CIBA SC HOLDING AG1OCG MICROELECTRONIC MATERIALS1
Top patents by PatentIndex Score
6 records- 0179US5627011AHigh resolution i-line photoresist of high sensitivityCIBA GEIGY CORP·Filed 1995·Granted May 6, 1997·43 cites·6 claims
- 0275US5558978APhotoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or bothOCG MICROELECTRONIC MATERIALS·Filed 1994·Granted Sep 24, 1996·44 cites·11 claims
- 0368US5759740AHigh resolution i-line photoresist of high sensitivityCIBA SC HOLDING AG·Filed 1996·Granted Jun 2, 1998·26 cites·5 claims
- 0457US5714559ACrosslinked polymersOLIN MICROELECTRONIC CHEM INC·Filed 1995·Granted Feb 3, 1998·16 cites·11 claims
- 0542US5650262AHigh-resolution negative photoresist with wide process latitudeFiled 1995·Granted Jul 22, 1997·11 cites·8 claims
- 0641US5834531ACrosslinked polymersOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Nov 10, 1998·5 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →