Inventor · disambiguated record
Hee-Bom Kim
Also filed as: KIM HEE-BOM
24 granted patents·6 pending applications·186 citations·filing 1997–2021
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD19CHOI JIN3HYUNDAI ELECTRONICS IND2LEE SANG-HEE2HYUNDAI ELECTRONICS IND CO LDT1
Top patents by PatentIndex Score
30 records- 0191US6049660ASimulation method in lithographic processHYUNDAI ELECTRONICS IND·Filed 1997·Granted Apr 11, 2000·134 cites·8 claims
- 0285US10437143B2Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicleSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 8, 2019·3 cites·14 claims
- 0381US7865866B2Method of inspecting mask using aerial image inspection apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jan 4, 2011·10 cites·20 claims
- 0476US7525089B2Method of measuring a critical dimension of a semiconductor device and a related apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 28, 2009·5 cites·14 claims
- 0574US7745072B2Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 29, 2010·4 cites·24 claims
- 0672US8137870B2Method of manufacturing photomaskLEE MYOUNG-SOO·Filed 2009·Granted Mar 20, 2012·6 cites·19 claims
- 0772US7642017B2Reflective photomask, method of fabricating the same, and reflective blank photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jan 5, 2010·3 cites·49 claims
- 0870US11281093B2Systems and methods using mask pattern measurements performed with compensated light signalsSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 22, 2022·0 cites·8 claims
- 0970US11067887B2Apparatus for manufacturing pellicleSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jul 20, 2021·0 cites·14 claims
- 1067US8475980B2Methods of forming semiconductor devices using photolithographic shot groupingCHOI JIN·Filed 2011·Granted Jul 2, 2013·1 cites·20 claims
- 1166US7601467B2Method of manufacturing EUVL alternating phase-shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 13, 2009·2 cites·18 claims
- 1261US8213722B2Method for inspecting critical dimension uniformity at high speed measurementKIM HEE-BOM·Filed 2009·Granted Jul 3, 2012·2 cites·10 claims
- 1361US7897299B2Phase-shift mask and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Mar 1, 2011·1 cites·18 claims
- 1461US7745068B2Binary photomask having a compensation layerSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 29, 2010·1 cites·20 claims
- 1560US11061322B2Systems and methods using mask pattern measurements performed with compensated light signalsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jul 13, 2021·0 cites·13 claims
- 1659US10747104B2Method of manufacturing pellicle and apparatus for assembling pellicleSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 18, 2020·0 cites·14 claims
- 1754US7736838B2Methods for forming pattern using electron beam and cell masks used in electron beam lithographySAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 15, 2010·0 cites·16 claims
- 1852US7939223B2Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 10, 2011·0 cites·17 claims
- 1949US2011244376A1Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 2048US8673522B2Method for manufacturing photomask and photomask manufactured using the sameCHOI JIN·Filed 2012·Granted Mar 18, 2014·0 cites·14 claims
- 2147US8329381B2Pattern forming methodCHOI JIN·Filed 2012·Granted Dec 11, 2012·0 cites·20 claims
- 2247US7754398B2Photo mask having assist pattern and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 13, 2010·0 cites·26 claims
- 2347US2011104593A1Phase-shift mask and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 2446US5773171APhase shift mask for forming contact holesHYUNDAI ELECTRONICS IND CO LDT·Filed 1997·Granted Jun 30, 1998·12 cites·9 claims
- 2544US6767672B2Method for forming a phase-shifting mask for semiconductor device manufactureHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jul 27, 2004·2 cites·14 claims
- 2643US2007111112A1Systems and methods for fabricating photo masksSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2742US2006177745A1Phase shift masksSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2842US2012314198A1Methods of estimating point spread functions in electron-beam lithography processesLEE SANG-HEE·Filed 2012·Application pending·0 cites
- 2938US8522172B2Method of forming photomask using calibration pattern, and photomask having calibration patternYOON YOUNG-KEUN·Filed 2011·Granted Aug 27, 2013·0 cites·20 claims
- 3038US2010266959A1Pattern forming methodLEE SANG-HEE·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →