Inventor · disambiguated record
Heng-Hsin Liu
Also filed as: LIU HENG-HSIN
129 granted patents·39 pending applications·224 citations·filing 1996–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD146TAIWAN SEMICONDUCTOR MFG6HUANG I-HSIUNG3LEE YUNG-YAO3PENG JUI-CHUNG2
Top patents by PatentIndex Score
168 records- 0198US11822256B2Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 21, 2023·5 cites·20 claims
- 0298US9841687B2Synchronized integrated metrology for overlay-shift reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 12, 2017·28 cites·20 claims
- 0397US12007694B2Lithography apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 11, 2024·4 cites·20 claims
- 0497US11693326B1System and method for dynamically controlling temperature of thermostatic reticlesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 4, 2023·7 cites·20 claims
- 0597US11693324B2System and method for detecting debris in a photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 4, 2023·3 cites·20 claims
- 0696US12019378B2Methods of cleaning a lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 25, 2024·2 cites·20 claims
- 0796US11392040B2System and method for performing extreme ultraviolet photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 19, 2022·4 cites·20 claims
- 0895US12061423B2Method and apparatus for mitigating tin debrisTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 13, 2024·2 cites·20 claims
- 0995US11520246B1Highly efficient automatic particle cleaner method for EUV systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 6, 2022·2 cites·19 claims
- 1094US11803129B2Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 31, 2023·3 cites·20 claims
- 1194US11768437B2System and method for performing extreme ultraviolet photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 26, 2023·2 cites·20 claims
- 1294US11747741B2Substrate stage, substrate processing system using the same, and method for processing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 5, 2023·2 cites·20 claims
- 1394US11662668B2Lithography contamination controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 30, 2023·2 cites·20 claims
- 1494US11553581B2Radiation source apparatus and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 10, 2023·2 cites·20 claims
- 1594US11437161B1Lithography apparatus and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 6, 2022·2 cites·20 claims
- 1694US11392041B2Particle removal device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 19, 2022·2 cites·20 claims
- 1794US8703368B2Lithography processLEE YUNG-YAO·Filed 2012·Granted Apr 22, 2014·14 cites·20 claims
- 1893US11809083B2EUV photolithography system fuel source and methods of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
- 1993US11720035B2Mitigating long-term energy decay of laser devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 8, 2023·2 cites·20 claims
- 2093US11533799B1System and method for supplying target material in an EUV light sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 20, 2022·2 cites·20 claims
- 2192US12147166B2Mitigating long-term energy decay of laser devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 19, 2024·1 cites·20 claims
- 2292US12085865B2System and method for detecting debris in a photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·1 cites·20 claims
- 2392US12078933B2System and method for omnidirectional real time detection of photolithography characteristicsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 3, 2024·2 cites·20 claims
- 2492US8199314B2System and method for improving immersion scanner overlay performancePENG JUI-CHUNG·Filed 2011·Granted Jun 12, 2012·12 cites·20 claims
- 2592US2025362594A1Lithography system and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2690US12164235B2Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 10, 2024·1 cites·20 claims
- 2789US11841625B2Device and method to remove debris from an extreme ultraviolet (EUV) lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 12, 2023·1 cites·20 claims
- 2889US2025362616A1Inspection tool for a semiconductor processing tool and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2988US12372887B2Methods of cleaning a lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 3088US11675272B2Method and apparatus for mitigating contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 13, 2023·1 cites·20 claims
- 3188US2025123576A1Systems for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3287US12210296B2Method of cleaning wafer table of photolithography system and method of manufacturing integrated circuitTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jan 28, 2025·0 cites·20 claims
- 3387US12066761B2Inspection tool for an extreme ultraviolet radiation source to observe tin residualTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 20, 2024·1 cites·20 claims
- 3487US11605477B1EUV lithography apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 14, 2023·1 cites·20 claims
- 3587US8592287B2Overlay alignment mark and method of detecting overlay alignment error using the markSHIH CHI-YUAN·Filed 2011·Granted Nov 26, 2013·7 cites·13 claims
- 3687US2025362615A1Lithography system and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3786US11602037B1Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 7, 2023·1 cites·20 claims
- 3886US11528797B2Method and system for generating droplets for EUV photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 13, 2022·1 cites·20 claims
- 3986US2025110414A1Reticle cleaning device and method of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4085US11647578B2Lithography thermal controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 9, 2023·1 cites·20 claims
- 4185US2025321500A1System and method for detecting debris in a photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4284US12405529B2Lithography system and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 2, 2025·0 cites·20 claims
- 4384US12210295B2Reticle cleaning device and method of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 28, 2025·0 cites·19 claims
- 4484US12111582B2Substrate stage and substrate processing system using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 8, 2024·0 cites·20 claims
- 4584US12111583B2Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 8, 2024·0 cites·20 claims
- 4684US2024385537A1Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4784US2024377762A1Semiconductor substrate stage for carring substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4884US2025348005A1Lithography apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4984US2025321492A1Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 5083US12085860B2System and method for monitoring and controlling extreme ultraviolet photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 10, 2024·1 cites·23 claims
Showing the top 50 of 168 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →