Inventor · disambiguated record
Hendrik Jan Hidde Smilde
Also filed as: SMILDE HENDRIK JAN HIDDE
40 granted patents·2 pending applications·407 citations·filing 2009–2022
97Inventor score
Files withASML NETHERLANDS BV32SMILDE HENDRIK JAN HIDDE6VAN DER SCHAAR MAURITS2CRAMER HUGO AUGUSTINUS JOSEPH1VAN DE KERKHOF MARCUS ADRIANUS1
Top patents by PatentIndex Score
42 records- 0199US9946167B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 17, 2018·18 cites·18 claims
- 0298US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0398US8867020B2Metrology method and apparatus, and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2011·Granted Oct 21, 2014·59 cites·14 claims
- 0498US8411287B2Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrateSMILDE HENDRIK JAN HIDDE·Filed 2010·Granted Apr 2, 2013·85 cites·33 claims
- 0597US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0697US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 0797US9140998B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2011·Granted Sep 22, 2015·24 cites·12 claims
- 0897US9134256B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Sep 15, 2015·29 cites·17 claims
- 0997US9081303B2Methods and scatterometers, lithographic systems, and lithographic processing cellsCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Jul 14, 2015·73 cites·24 claims
- 1096US8994944B2Methods and scatterometers, lithographic systems, and lithographic processing cellsASML NETHERLANDS BV·Filed 2014·Granted Mar 31, 2015·24 cites·16 claims
- 1194US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 1293US10739687B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Aug 11, 2020·4 cites·22 claims
- 1393US10331043B2Optimization of target arrangement and associated targetASML NETHERLANDS BV·Filed 2015·Granted Jun 25, 2019·6 cites·20 claims
- 1492US10162271B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Dec 25, 2018·7 cites·20 claims
- 1592US9910366B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Mar 6, 2018·9 cites·20 claims
- 1690US9811003B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 7, 2017·5 cites·19 claims
- 1790US9255892B2Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Feb 9, 2016·6 cites·17 claims
- 1887US10042268B2Method, apparatus and substrates for lithographic metrologyASML NETHERLANDS BV·Filed 2014·Granted Aug 7, 2018·5 cites·20 claims
- 1987US9879988B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 30, 2018·4 cites·20 claims
- 2085US9714827B2Metrology method and apparatus, lithographic system, device manufacturing method and substrateASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·6 cites·10 claims
- 2183US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 2283US10126662B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Nov 13, 2018·2 cites·12 claims
- 2383US8223347B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2010·Granted Jul 17, 2012·4 cites·7 claims
- 2482US12429328B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 2581US10162272B2Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Dec 25, 2018·2 cites·23 claims
- 2678US10331041B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jun 25, 2019·1 cites·12 claims
- 2778US9535338B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jan 3, 2017·3 cites·11 claims
- 2876US8709687B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodVAN DER SCHAAR MAURITS·Filed 2012·Granted Apr 29, 2014·3 cites·6 claims
- 2975US9235141B2Inspection apparatus and method for measuring a property of a substrateVAN DER SCHAAR MAURITS·Filed 2011·Granted Jan 12, 2016·2 cites·15 claims
- 3074US11181828B2Method of determining a value of a parameter of interest of a patterning process, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Nov 23, 2021·2 cites·20 claims
- 3171US11526085B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Dec 13, 2022·0 cites·20 claims
- 3265US11092900B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2019·Granted Aug 17, 2021·0 cites·20 claims
- 3365US10725386B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jul 28, 2020·0 cites·20 claims
- 3460US9535342B2Metrology method and apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jan 3, 2017·0 cites·20 claims
- 3557US9331022B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted May 3, 2016·0 cites·5 claims
- 3656US11392043B2Method and metrology apparatus for determining estimated scattered radiation intensityASML NETHERLANDS BV·Filed 2019·Granted Jul 19, 2022·0 cites·7 claims
- 3756US9081304B2Substrate, an inspection apparatus, and a lithographic apparatusSMILDE HENDRIK JAN HIDDE·Filed 2009·Granted Jul 14, 2015·1 cites·14 claims
- 3855US9719945B2Metrology method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Aug 1, 2017·0 cites·20 claims
- 3955US9229338B2Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatusVAN DE KERKHOF MARCUS ADRIANUS·Filed 2009·Granted Jan 5, 2016·0 cites·5 claims
- 4053US11466980B2Metrology method and apparatus, lithographic system, device manufacturing method and substrateASML NETHERLANDS BV·Filed 2017·Granted Oct 11, 2022·0 cites·8 claims
- 4150US2016179019A1Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2016·Application pending·0 cites
- 4240US2012044470A1Substrate for Use in Metrology, Metrology Method and Device Manufacturing MethodSMILDE HENDRIK JAN HIDDE·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →